English

SemiKong: Curating, Training, and Evaluating A Semiconductor Industry-Specific Large Language Model

Computation and Language 2024-11-25 v2

Abstract

Large Language Models (LLMs) have demonstrated the potential to address some issues within the semiconductor industry. However, they are often general-purpose models that lack the specialized knowledge needed to tackle the unique challenges of this sector, such as the intricate physics and chemistry of semiconductor devices and processes. SemiKong, the first industry-specific LLM for the semiconductor domain, provides a foundation that can be used to develop tailored proprietary models. With SemiKong 1.0, we aim to develop a foundational model capable of understanding etching problems at an expert level. Our key contributions include (a) curating a comprehensive corpus of semiconductor-related texts, (b) creating a foundational model with in-depth semiconductor knowledge, and (c) introducing a framework for integrating expert knowledge, thereby advancing the evaluation process of domain-specific AI models. Through fine-tuning a pre-trained LLM using our curated dataset, we have shown that SemiKong outperforms larger, general-purpose LLMs in various semiconductor manufacturing and design tasks. Our extensive experiments underscore the importance of developing domain-specific LLMs as a foundation for company- or tool-specific proprietary models, paving the way for further research and applications in the semiconductor domain. Code and dataset will be available at https://github.com/aitomatic/semikong

Keywords

Cite

@article{arxiv.2411.13802,
  title  = {SemiKong: Curating, Training, and Evaluating A Semiconductor Industry-Specific Large Language Model},
  author = {Christopher Nguyen and William Nguyen and Atsushi Suzuki and Daisuke Oku and Hong An Phan and Sang Dinh and Zooey Nguyen and Anh Ha and Shruti Raghavan and Huy Vo and Thang Nguyen and Lan Nguyen and Yoshikuni Hirayama},
  journal= {arXiv preprint arXiv:2411.13802},
  year   = {2024}
}

Comments

On-going work

R2 v1 2026-06-28T20:07:17.444Z