We have grown superconducting TiN films by atomic layer deposition with thicknesses ranging from 6 to 89 nm. This deposition method allows us to tune the resistivity and critical temperature by controlling the film thickness. The microwave properties are measured, using a coplanar-waveguide resonator, and we find internal quality factors above a million, high sheet inductances (5.2-620 pH), and pulse response times up to 100 \mu s. The high normal state resistivity of the films (> 100 \mu\Omega cm) affects the superconducting state and thereby the electrodynamic response. The microwave response is modeled using a quasiparticle density of states modified with an effective pair-breaker,consistently describing the measured temperature dependence of the quality factor and the resonant frequency.
@article{arxiv.1212.4434,
title = {Microwave properties of superconducting atomic-layer deposited TiN films},
author = {P. C. J. J. Coumou and M. R. Zuiddam and E. F. C. Driessen and P. J. de Visser and J. J. A. Baselmans and T. M. Klapwijk},
journal= {arXiv preprint arXiv:1212.4434},
year = {2013}
}
Comments
This manuscript is submitted to ASC 2012 Special Issue