Low-loss Waveguide Fabrication by Inkjet Printing on Porous Silicon
Applied Physics
2019-07-24 v2 Optics
Abstract
We report fabrication of optical waveguides embedded in oxidised porous silicon in a mask-less process. Patterned pore-filling was attained by means of inkjet printing, enabling lateral modification of the waveguide's index of refraction and other optical properties thus providing full two-dimensional refractive index control of the optical waveguide. The waveguides were created by applying a KDP salt solution over a porous silicon film by means of a material printer. Light guiding was demonstrated at wavelengths 1.064 and 1.550 microns. Measured values of the intensity attenuation at these wavelengths were 2.5 dB/cm and below 1.3 dB/cm respectively
Keywords
Cite
@article{arxiv.1812.03881,
title = {Low-loss Waveguide Fabrication by Inkjet Printing on Porous Silicon},
author = {Alexander Kellarev and Shlomo Ruschin},
journal= {arXiv preprint arXiv:1812.03881},
year = {2019}
}