English

Linear and nonlinear regime of a Random Resistor Network under biased percolation

Statistical Mechanics 2007-05-23 v1

Abstract

We investigate the steady state of a two-dimensional random resistor network subjected to two competing biased percolations as a function of the bias strength. The properties of the linear and nonlinear regimes are studied by means of Monte Carlo simulations. In constant current conditions, a scaling relation is found between <R>/<R>0<R>/<R>_0 and I/I0I/I_0, where <R><R> is the average network resistance, <R>0<R>_0 the Ohmic resistance and I0I_0 an appropriate threshold value for the onset of nonlinearity. A similar scaling relation is found also for the relative variance of resistance fluctuations. These results are in good agreement with electrical breakdown measurements performed in composite materials.

Keywords

Cite

@article{arxiv.cond-mat/0201152,
  title  = {Linear and nonlinear regime of a Random Resistor Network under biased percolation},
  author = {C. Pennetta and E. Alfinito and L. Reggiani},
  journal= {arXiv preprint arXiv:cond-mat/0201152},
  year   = {2007}
}

Comments

Contribution to the Proceedings of the Workshop CMS2001