English

Interstitial-Boron Solution Strengthened WB$_{3+x}$

Materials Science 2015-06-17 v2 Mesoscale and Nanoscale Physics

Abstract

By means of variable-composition evolutionary algorithm coupled with density functional theory and in combination with aberration-corrected high-resolution transmission electron microscopy experiments, we have studied and characterized the composition, structure and hardness properties of WB3+x_{3+x} (xx << 0.5). We provide robust evidence for the occurrence of stoichiometric WB3_3 and non-stoichiometric WB3+x_{3+x} both crystallizing in the metastable hPhP16 (P63/mmcP6_3/mmc) structure. No signs for the formation of the highly debated WB4_4 (both hPhP20 and hPhP10) phases were found. Our results rationalize the seemingly contradictory high-pressure experimental findings and suggest that the interstitial boron atom is located in the tungsten layer and vertically interconnect with four boron atoms, thus forming a typical three-center boron net with the upper and lower boron layers in a three-dimensional covalent network, which thereby strengthen the hardness.

Keywords

Cite

@article{arxiv.1309.2575,
  title  = {Interstitial-Boron Solution Strengthened WB$_{3+x}$},
  author = {Xiyue Cheng and Wei Zhang and Xing-Qiu Chen and Haiyang Niu and Peitao Liu and Kui Du and Gang Liu and Dianzhong Li and Hui-Ming Cheng and Hengqiang Ye and Yiyi Li},
  journal= {arXiv preprint arXiv:1309.2575},
  year   = {2015}
}

Comments

5 pages, 5 figures

R2 v1 2026-06-22T01:24:19.917Z