Influence of carbon dioxide and water concentration on terbium thin films produced by Molecular Plating
Abstract
Terbium and thulium thin films were produced by Molecular Plating under controlled conditions to elucidate a possible influence of water and carbon dioxide present in the plating solution. Platings were made in a glovebox with variable concentration of residual water and \ce{CO2} in a controlled inert atmosphere to study the impact on the quality of the produced thin films and on deposition yields. The morphology of the thin films was analyzed by scanning electron microscopy. The deposition yield was determined by neutron activation analysis at the research reactor TRIGA Mainz. Chemical analysis of the deposited layers was conducted using a combination of infrared, Raman and X-ray photoelectron spectroscopy. The Raman and IR spectra reveal the formation of hydroxides, oxides and carbonates. Water in the plating solution affects the quality of the thin films when its concentration exceeds 1 vol.-\%. The presence of \ce{CO2} leads to an increased carbonate content, which negatively influences the film quality
Cite
@article{arxiv.2509.17036,
title = {Influence of carbon dioxide and water concentration on terbium thin films produced by Molecular Plating},
author = {Ernst Artes and Primiana Cavallo and Tobias Häger and Carl-Christian Meyer and Christoph Mokry and Dennis Renisch and Jörg Runke and Evgenia Schaffner and Alice Seibert and Christina Trautmann and Christoph E. Düllmann},
journal= {arXiv preprint arXiv:2509.17036},
year = {2025}
}
Comments
Radiochim. Acta 2025; aop