We have studied the surface quality of millimeter-scale optical mirrors produced by etching CZ and FZ silicon wafers in potassium hydroxide to expose the {111} planes. We find that the FZ surfaces have four times lower noise power at spatial frequencies up to 500mm−1. We conclude that mirrors made using FZ wafers have higher optical quality.
@article{arxiv.1307.3980,
title = {Improved surface quality of anisotropically etched silicon {111} planes for mm-scale integrated optics},
author = {J. P. Cotter and I. Zeimpekis and M Kraft and E A Hinds},
journal= {arXiv preprint arXiv:1307.3980},
year = {2013}
}