English

Importance of van der Waals interactions for ab initio studies of topological insulators

Mesoscale and Nanoscale Physics 2020-12-01 v2 Materials Science

Abstract

We investigate the lattice and electronic structures of the bulk and surface of the prototypical layered topological insulators Bi2_2Se3_3 and Bi2_2Te3_3 using ab initio density functional methods, and systematically compare the results of different methods of including van der Waals (vdW) interactions. We show that the methods utilizing semi-empirical energy corrections yield accurate descriptions of these materials, with the most precise results obtained by properly accounting for the long-range tail of the vdW interactions. The bulk lattice constants, distances between quintuple layers and the Dirac velocity of the topological surface states (TSS) are all in excellent agreement with experiment. In Bi2_2Te3_3, hexagonal warping of the energy dispersion leads to complex spin textures of the TSS at moderate energies, while in Bi2_2Se3_3 these states remain almost perfectly helical away from the Dirac point, showing appreciable signs of hexagonal warping at much higher energies, above the minimum of the bulk conduction band. Our results establish a framework for unified and systematic self-consistent first principles calculations of topological insulators in bulk, slab and interface geometries, and provides the necessary first step towards ab initio modeling of topological heterostructures.

Keywords

Cite

@article{arxiv.1905.01269,
  title  = {Importance of van der Waals interactions for ab initio studies of topological insulators},
  author = {K. Shirali and W. A. Shelton and I. Vekhter},
  journal= {arXiv preprint arXiv:1905.01269},
  year   = {2020}
}

Comments

26 pages, 7 figures. This is the Accepted Manuscript version of an article accepted for publication in Journal of Physics: Condensed Matter. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://dx.doi.org/10.1088/1361-648X/abbdbc