How ripples turn into dots: modeling ion-beam erosion under oblique incidence
Materials Science
2009-11-11 v2 Statistical Mechanics
Abstract
Pattern formation on semiconductor surfaces induced by low energetic ion-beam erosion under normal and oblique incidence is theoretically investigated using a continuum model in form of a stochastic, nonlocal, anisotropic Kuramoto-Sivashinsky equation. Depending on the size of the parameters this model exhibits hexagonally ordered dot, ripple, less regular and even rather smooth patterns. We investigate the transitional behavior between such states and suggest how transitions can be experimentally detected.
Keywords
Cite
@article{arxiv.cond-mat/0509437,
title = {How ripples turn into dots: modeling ion-beam erosion under oblique incidence},
author = {Sebastian Vogel and Stefan J. Linz},
journal= {arXiv preprint arXiv:cond-mat/0509437},
year = {2009}
}
Comments
11 pages, 4 figures, submitted for publication, revised version