Helium Ion Microcopy (HIM) based on Gas Field Ion Sources (GFIS) represents a new ultra high resolution microscopy and nano-fabrication technique. It is an enabling technology that not only provides imagery of conducting as well as uncoated insulating nano-structures but also allows to create these features. The latter can be achieved using resists or material removal due to sputtering. The close to free-form sculpting of structures over several length scales has been made possible by the extension of the method to other gases such as Neon. A brief introduction of the underlying physics as well as a broad review of the applicability of the method is presented in this review.
Cite
@article{arxiv.1311.1711,
title = {Helium Ion Microscopy},
author = {Gregor Hlawacek and Vasilisa Veligura and Raoul van Gastel and Bene Poelsema},
journal= {arXiv preprint arXiv:1311.1711},
year = {2014}
}