English

Epitaxial thin film growth in the U-Ge binary system

Materials Science 2026-01-21 v1

Abstract

We explore the U-Ge phase diagram using thin film growth by co-deposition of U and Ge via d.c. magnetron sputtering. Using three different single crystal substrates - MgO, CaF2_2 and SrTiO3_3 - we have stabilised mixed phase films of mostly UGe3_3 and UGe, with evidence of UGe2_2 as well. At higher temperatures UO2_2 forms as a consequence of gettering of oxygen from several types of substrate. Several UGe3_3 dominated samples grown on MgO substrates have also been characterised electrically, showing residual resistivity ratios up to six.

Keywords

Cite

@article{arxiv.2601.13290,
  title  = {Epitaxial thin film growth in the U-Ge binary system},
  author = {Syed Akbar Hussain and Ali A. M. H. Jasem and Lottie M. Harding and Ross S. Springell and Christopher Bell},
  journal= {arXiv preprint arXiv:2601.13290},
  year   = {2026}
}

Comments

15 pages, 9 figures

R2 v1 2026-07-01T09:11:14.656Z