Interfacial thermal resistance arises challenges for the thermal management as the modern semiconductors are miniatured to nanoscale. Previous studies found that graded mass distribution in interface can maximumly enhance the interfacial thermal conductance of crystalline interface, however, whether this strategy is effective for amorphous interface is less explored. In this work, graded mass distribution in the amorphous interface between crystalline Si and crystalline Ge is optimized to increase the interfacial thermal conductance by the extended atomistic Greens function method.
@article{arxiv.2306.15254,
title = {Enhancing interfacial thermal conductance of amorphous interface by optimized interfacial mass distribution},
author = {Lina Yang and Baosheng Yang and Baowen Li},
journal= {arXiv preprint arXiv:2306.15254},
year = {2023}
}