Deposition Order Dependent Magnetization Reversal in Pressure Graded Co/Pd films

Peter K. Greene; B. J. Kirby; J. W. Lau; J. A. Borchers; M. R. Fitzsimmons; Kai Liu

doi:10.1063/1.4871586

Deposition Order Dependent Magnetization Reversal in Pressure Graded Co/Pd films

Materials Science 2014-04-15 v1

Authors: Peter K. Greene , B. J. Kirby , J. W. Lau , J. A. Borchers , M. R. Fitzsimmons , Kai Liu

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Abstract

Magnetization reversal mechanisms and depth-dependent magnetic profile have been investigated in Co/Pd thin films magnetron-sputtered under continuously varying pressure with opposite deposition orders. For samples grown under increasing pressure, magnetization reversal is dominated by domain nucleation, propagation and annihilation; an anisotropy gradient is effectively established, along with a pronounced depth-dependent magnetization profile. However, in films grown under decreasing pressure, disorders propagate vertically from the bottom high-pressure region into the top low-pressure region, impeding domain wall motion and forcing magnetization reversal via rotation; depth-dependent magnetization varies in an inverted order, but the spread is much suppressed.

Keywords

magnetization reversal Co/Pd thin films deposition order pressure gradient domain nucleation anisotropy gradient magnetron sputtering

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@article{arxiv.1404.1350,
  title  = {Deposition Order Dependent Magnetization Reversal in Pressure Graded Co/Pd films},
  author = {Peter K. Greene and B. J. Kirby and J. W. Lau and J. A. Borchers and M. R. Fitzsimmons and Kai Liu},
  journal= {arXiv preprint arXiv:1404.1350},
  year   = {2014}
}

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17 pages, 4 figures

Deposition Order Dependent Magnetization Reversal in Pressure Graded Co/Pd films

Abstract

Keywords

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