Degradation of Ag/Si multilayers during heat treatments

K. Kapta; L. Daroczi; Z. Papp; D. L. Beke; G. A. Langer; A. Csik; M. Kis-Varga; A. L. Greer; Z. H. Barber

Degradation of Ag/Si multilayers during heat treatments

Materials Science 2009-02-13 v1

Authors: K. Kapta , L. Daroczi , Z. Papp , D. L. Beke , G. A. Langer , A. Csik , M. Kis-Varga , A. L. Greer , Z. H. Barber

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Abstract

Microstructure changes during annealing of nano-crystalline silver and amorphous silicon multilayers (Ag/a-Si) have been studied by X-ray diffraction and transmission electron microscopy. The dc-magnetron sputtered Ag/a-Si multilayers remained stable even after annealing at 523K for 10h, and microstructural changes occurred only above 600K. The degradation of Ag/a-Si multilayers can be described by the increase of size of Ag grains, formation of grooves and pinholes at Ag grain boundaries and by the diffusion of silicon atoms through the silver grain boundaries and along the Ag/a-Si interfaces. This results in thinning of a-Si layers, and in formation of Ag granulates after longer annealing times.

Keywords

Ag/Si multilayers heat treatment degradation microstructure grain growth diffusion

Cite

@article{arxiv.0902.2045,
  title  = {Degradation of Ag/Si multilayers during heat treatments},
  author = {K. Kapta and L. Daroczi and Z. Papp and D. L. Beke and G. A. Langer and A. Csik and M. Kis-Varga and A. L. Greer and Z. H. Barber},
  journal= {arXiv preprint arXiv:0902.2045},
  year   = {2009}
}

Degradation of Ag/Si multilayers during heat treatments

Abstract

Keywords

Cite

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