English

Defects in h-BN tunnel barrier for local electrostatic probing of two dimensional materials

Mesoscale and Nanoscale Physics 2018-08-28 v1

Abstract

Defects in hexagonal boron nitride (h-BN) layer can facilitate tunneling current through thick h-BN tunneling barriers. We have investigated such current-mediating defects as local probes for materials in two dimensional heterostructure stacks. Besides IVIV characteristics and negative differential conductance, we have characterized the electrical properties of h-BN defects in vertical graphene-h-BN-Cr/Au tunnel junctions in terms of low frequency current noise. Our results indicate a charge sensitivity of 1.5×\times105 10^-5e/Hz\sqrt Hz at 10 HzHz, which is equal to good metallic single electron transistors. The noise spectra at low frequency are governed by a few two-level fluctuators. For variations in electrochemical potential, we achieve a sensitivity of 0.8μ\mueV/Hz\sqrt Hz.

Keywords

Cite

@article{arxiv.1808.08743,
  title  = {Defects in h-BN tunnel barrier for local electrostatic probing of two dimensional materials},
  author = {Ying Liu and Zhenbing Tan and Manohar Kumar and T. S. Abhilash and Guan-jun Liu and Pertti Hakonen},
  journal= {arXiv preprint arXiv:1808.08743},
  year   = {2018}
}