Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metal-organic framework

Matthew J. Cliffe; Joshua A. Hill; Claire A. Murray; Francois-Xavier Coudert; Andrew L. Goodwin

doi:10.1039/C5CP01307K

Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metal-organic framework

Materials Science 2016-07-22 v2

Authors: Matthew J. Cliffe , Joshua A. Hill , Claire A. Murray , Francois-Xavier Coudert , Andrew L. Goodwin

View on arXiv ↗ PDF ↗ DOI ↗

Abstract

Thermally-densified hafnium terephthalate UiO-66(Hf) is shown to exhibit the strongest isotropic negative thermal expansion (NTE) effect yet reported for a metal-organic framework (MOF). Incorporation of correlated vacancy defects within the framework affects both the extent of thermal densification and the magnitude of NTE observed in the densified product. We thus demonstrate that defect inclusion can be used to tune systematically the physical behaviour of a MOF.

Keywords

negative thermal expansion metal-organic framework UiO-66(Hf) vacancy defects thermal densification hafnium terephthalate

Cite

@article{arxiv.1503.01668,
  title  = {Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metal-organic framework},
  author = {Matthew J. Cliffe and Joshua A. Hill and Claire A. Murray and Francois-Xavier Coudert and Andrew L. Goodwin},
  journal= {arXiv preprint arXiv:1503.01668},
  year   = {2016}
}

Comments

8 pages, 4 figures, revised

Related papers

View all related →