Chemical-etch-assisted growth of epitaxial zinc oxide

E. J. Adles; D. E. Aspnes

Chemical-etch-assisted growth of epitaxial zinc oxide

Materials Science 2009-10-13 v1

Authors: E. J. Adles , D. E. Aspnes

Abstract

We use real-time spectroscopic polarimetric observations of growth and a chemical model derived therefrom, to develop a method of growing dense, two-dimensional zinc oxide epitaxially on sapphire by metalorganic chemical vapor deposition. Particulate zinc oxide formed in the gas phase is used to advantage as the deposition source. Our real-time data provide unequivocal evidence that: a seed layer is required; unwanted fractions of ZnO are deposited; but these fractions can be removed by cycling between brief periods of net deposition and etching. The transition between deposition and etching occurs with zinc precursor concentrations that only differ by 13%. These processes are understood by considering the chemistry involved.

Keywords

zinc oxide epitaxial growth metalorganic chemical vapor deposition chemical etching real-time polarimetry seed layer

Cite

@article{arxiv.0910.2199,
  title  = {Chemical-etch-assisted growth of epitaxial zinc oxide},
  author = {E. J. Adles and D. E. Aspnes},
  journal= {arXiv preprint arXiv:0910.2199},
  year   = {2009}
}

Comments

9 pages, 5 figures

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