A Robust Approach for the Growth of Epitaxial Spinel Ferrite Films

J. X. Ma; D. Mazumdar; G. Kim; H. Sato; N. Z. Bao; A. Gupta

doi:10.1063/1.3488638

A Robust Approach for the Growth of Epitaxial Spinel Ferrite Films

Materials Science 2015-05-19 v1

Authors: J. X. Ma , D. Mazumdar , G. Kim , H. Sato , N. Z. Bao , A. Gupta

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Abstract

Heteroepitaxial spinel ferrites NiFe2O4 and CoFe2O4 films have been prepared by pulsed laser deposition (PLD) at various temperatures (175 - 690 {\deg}C) under ozone/oxygen pressure of 10 mTorr. Due to enhanced kinetic energy of ablated species at low pressure and enhanced oxidation power of ozone, epitaxy has been achieved at significantly lower temperatures than previously reported. Films grown at temperature below 550 {\deg}C show a novel growth mode, which we term "vertical step-flow" growth mode. Epitaxial spinel ferrite films with atomically flat surface over large areas and enhanced magnetic moment can be routinely obtained. Interestingly, the growth mode is independent of the nature of substrates (spinel MgAl2O4, perovskite SrTiO3, and rock salt MgO) and film thicknesses. The underlying growth mechanism is discussed.

Keywords

spinel ferrite films pulsed laser deposition epitaxial growth vertical step-flow growth mode heteroepitaxy magnetic moment

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@article{arxiv.1006.1161,
  title  = {A Robust Approach for the Growth of Epitaxial Spinel Ferrite Films},
  author = {J. X. Ma and D. Mazumdar and G. Kim and H. Sato and N. Z. Bao and A. Gupta},
  journal= {arXiv preprint arXiv:1006.1161},
  year   = {2015}
}

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A Robust Approach for the Growth of Epitaxial Spinel Ferrite Films

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