English

A Review of Proximity Effect Correction in Electron-beam Lithography

Mesoscale and Nanoscale Physics 2015-09-18 v1

Abstract

I review the work of proximity effect correction (PEC) in electron-beam (e-beam) lithography with emphasis on dose modification and shape modification PEC techniques.

Keywords

Cite

@article{arxiv.1509.05169,
  title  = {A Review of Proximity Effect Correction in Electron-beam Lithography},
  author = {Pengcheng Li},
  journal= {arXiv preprint arXiv:1509.05169},
  year   = {2015}
}