In this article, we present a contact resistivity extraction method calibrated using a de-embedding structure, called High-Resolution Transmission Line Model (HR-TLM). HR-TLM has the similar infrastructure with Refined TLM (RTLM) or Refined-Ladder TLM(R-LTLM), but is optimized for calibration methods. Its advantage lies in maintaining low \r{ho}_c extraction accuracy while significantly reducing the impact of structural process errors. According to the error analysis model, we verify that the extraction accuracy of HR-TLM based on R-LTLM can reach 10-9 {\Omega}cm2 at micron scale lithography precision.
@article{arxiv.2504.20439,
title = {A High-Resolution Transmission Line Model with De-embedding Structure for Ultralow Contact Resistivity Extraction},
author = {Xuanyu Jia and Hongxu Liao and Ming Li},
journal= {arXiv preprint arXiv:2504.20439},
year = {2025}
}