Fabrication of quantum processors in advanced 300 mm wafer-scale complementary metal-oxide-semiconductor (CMOS) foundries provides a unique scaling pathway towards commercially viable quantum computing with potentially millions of qubits on a single chip. Here, we show precise qubit operation of a silicon two-qubit device made in a 300 mm semiconductor processing line. The key metrics including single- and two-qubit control fidelities exceed 99% and state preparation and measurement fidelity exceeds 99.9%, as evidenced by gate set tomography (GST). We report coherence and lifetimes up to T2∗=30.4μs, T2Hahn=803μs, and T1=6.3 s. Crucially, the dominant operational errors originate from residual nuclear spin carrying isotopes, solvable with further isotopic purification, rather than charge noise arising from the dielectric environment. Our results answer the longstanding question whether the favourable properties including high-fidelity operation and long coherence times can be preserved when transitioning from a tailored academic to an industrial semiconductor fabrication technology.
Cite
@article{arxiv.2410.15590,
title = {A 300 mm foundry silicon spin qubit unit cell exceeding 99% fidelity in all operations},
author = {Paul Steinacker and Nard Dumoulin Stuyck and Wee Han Lim and Tuomo Tanttu and MengKe Feng and Andreas Nickl and Santiago Serrano and Marco Candido and Jesus D. Cifuentes and Fay E. Hudson and Kok Wai Chan and Stefan Kubicek and Julien Jussot and Yann Canvel and Sofie Beyne and Yosuke Shimura and Roger Loo and Clement Godfrin and Bart Raes and Sylvain Baudot and Danny Wan and Arne Laucht and Chih Hwan Yang and Andre Saraiva and Christopher C. Escott and Kristiaan De Greve and Andrew S. Dzurak},
journal= {arXiv preprint arXiv:2410.15590},
year = {2025}
}