2D ferroelectric narrow-bandgap semiconductor Wurtzite' type alpha-In2Se3 and its silicon-compatible growth
Abstract
2D van der Waals ferroelectrics, particularly alpha-In2Se3, have emerged as an attractive building block for next-generation information storage technologies due to their moderate band gap and robust ferroelectricity stabilized by dipole locking. alpha-In2Se3 can adopt either the distorted zincblende or wurtzite structures; however, the wurtzite phase has yet to be experimental-ly validated, and its large-scale synthesis poses significant challenges. Here, we report an in-situ transport growth of centimeter-scale wurtzite type alpha-In2Se3 films directly on SiO2 substrates using a process combining pulsed laser deposition and chemical vapor deposition. We demonstrate that it is a narrow bandgap ferroelectric semiconductor, featuring a Curie tem-perature exceeding 620 K, a tunable bandgap (0.8-1.6 eV) modulated by charged domain walls, and a large optical absorption coefficient of 1.3 times 10 powers 6 per centemeter. Moreover, light absorption promotes the dynamic conductance range, linearity, and symmetry of the synapse devices, leading to a high recognition accuracy of 92.3 percent in a supervised pattern classification task for neuromorphic computing. Our findings demonstrate a ferroelectric polymorphism of In2Se3, highlighting its potential in ferroelectric synapses for neuromorphic computing.
Keywords
Cite
@article{arxiv.2602.08381,
title = {2D ferroelectric narrow-bandgap semiconductor Wurtzite' type alpha-In2Se3 and its silicon-compatible growth},
author = {Yuxuan Jiang and Xingkun Ning and Renhui Liu and Kepeng Song and Sajjad Ali and Haoyue Deng and Yizhuo Li and Biaohong Huang and Jianhang Qiu and Xiaofei Zhu and Zhen Fan and Qiankun Li and Chengbing Qin and Fei Xue and Teng Yang and Bing Li and Gang Liu and Weijin Hu and Lain-Jong Li and Zhidong Zhang},
journal= {arXiv preprint arXiv:2602.08381},
year = {2026}
}
Comments
29 pages, 5 figures, 1 table