Study on Sub monolayer Epitaxy Growth under Anisotropic Detachment
Materials Science
2019-12-11 v1 Applied Physics
Abstract
We have performed Kinetic Monte Carlo simulation to study the effect of diffusion anisotropy and bonding anisotropy on island formation at different temperatures during the sub-monolayer film growth in Molecular Beam Epitaxy. We use simple cubic solid on solid model and event based Bortz, Kalos and Labowitch (BKL) algorithm on Kinetic Monte Carlo method to simulate the physical phenomena. We have found that surface anisotropy has no significant role on island elongation however it influences on the island morphology, growth exponent and island size distribution. Elongated islands were obtained when bonding anisotropy was included.
Keywords
Cite
@article{arxiv.1912.04877,
title = {Study on Sub monolayer Epitaxy Growth under Anisotropic Detachment},
author = {Jagannath Devkota and Shankar P. Shrestha},
journal= {arXiv preprint arXiv:1912.04877},
year = {2019}
}
Comments
7 pages, J. of Nepal Phys. Soc. Vol 24, No 1., December 2008