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Non-stochastic behavior of atomic surface diffusion on Cu(111) at all temperatures

Other Condensed Matter 2016-08-16 v1

Abstract

Atomic diffusion is usually understood as a succession of random, independent displacements of an adatom over the surface's potential energy landscape. Nevertheless, an analysis of Molecular Dynamics simulations of self-diffusion on Cu(111) demonstrates the existence of different types of correlations in the atomic jumps at all temperatures. Thus, the atomic displacements cannot be correctly described in terms of a random walk model. This fact has a profound impact on the determination and interpretation of diffusion coefficients.

Keywords

Cite

@article{arxiv.cond-mat/0403565,
  title  = {Non-stochastic behavior of atomic surface diffusion on Cu(111) at all temperatures},
  author = {J. Ferrón and L. Gómez and J. J. de Miguel and R. Miranda},
  journal= {arXiv preprint arXiv:cond-mat/0403565},
  year   = {2016}
}

Comments

5 figures

R2 v1 2026-07-22T11:01:18.592Z