Sewing patterns define the structural foundation of garments and are essential for applications such as fashion design, fabrication, and physical simulation. Despite progress in automated pattern generation, accurately modeling sewing patterns remains difficult due to the broad variability in panel geometry and seam arrangements. In this work, we introduce a sewing pattern modeling method based on an implicit representation. We represent each panel using a signed distance field that defines its boundary and an unsigned distance field that identifies seam endpoints, and encode these fields into a continuous latent space that enables differentiable meshing. A latent flow matching model learns distributions over panel combinations in this representation, and a stitching prediction module recovers seam relations from extracted edge segments. This formulation allows accurate modeling and generation of sewing patterns with complex structures. We further show that it can be used to estimate sewing patterns from images with improved accuracy relative to existing approaches, and supports applications such as pattern completion and refitting, providing a practical tool for digital fashion design.
@article{arxiv.2601.17740,
title = {Learning Sewing Patterns via Latent Flow Matching of Implicit Fields},
author = {Cong Cao and Ren Li and Corentin Dumery and Hao Li},
journal= {arXiv preprint arXiv:2601.17740},
year = {2026}
}