English

Improving Masked Autoencoders by Learning Where to Mask

Computer Vision and Pattern Recognition 2024-01-09 v2

Abstract

Masked image modeling is a promising self-supervised learning method for visual data. It is typically built upon image patches with random masks, which largely ignores the variation of information density between them. The question is: Is there a better masking strategy than random sampling and how can we learn it? We empirically study this problem and initially find that introducing object-centric priors in mask sampling can significantly improve the learned representations. Inspired by this observation, we present AutoMAE, a fully differentiable framework that uses Gumbel-Softmax to interlink an adversarially-trained mask generator and a mask-guided image modeling process. In this way, our approach can adaptively find patches with higher information density for different images, and further strike a balance between the information gain obtained from image reconstruction and its practical training difficulty. In our experiments, AutoMAE is shown to provide effective pretraining models on standard self-supervised benchmarks and downstream tasks.

Keywords

Cite

@article{arxiv.2303.06583,
  title  = {Improving Masked Autoencoders by Learning Where to Mask},
  author = {Haijian Chen and Wendong Zhang and Yunbo Wang and Xiaokang Yang},
  journal= {arXiv preprint arXiv:2303.06583},
  year   = {2024}
}

Comments

14 pages, 8 figures. This paper has been accepted by PRCV 2023

R2 v1 2026-06-28T09:12:39.736Z