Masked image modeling is a promising self-supervised learning method for visual data. It is typically built upon image patches with random masks, which largely ignores the variation of information density between them. The question is: Is there a better masking strategy than random sampling and how can we learn it? We empirically study this problem and initially find that introducing object-centric priors in mask sampling can significantly improve the learned representations. Inspired by this observation, we present AutoMAE, a fully differentiable framework that uses Gumbel-Softmax to interlink an adversarially-trained mask generator and a mask-guided image modeling process. In this way, our approach can adaptively find patches with higher information density for different images, and further strike a balance between the information gain obtained from image reconstruction and its practical training difficulty. In our experiments, AutoMAE is shown to provide effective pretraining models on standard self-supervised benchmarks and downstream tasks.
@article{arxiv.2303.06583,
title = {Improving Masked Autoencoders by Learning Where to Mask},
author = {Haijian Chen and Wendong Zhang and Yunbo Wang and Xiaokang Yang},
journal= {arXiv preprint arXiv:2303.06583},
year = {2024}
}
Comments
14 pages, 8 figures. This paper has been accepted by PRCV 2023