Related papers: Control of Electron Energy Distribution Functions …
Tailoring ion energy distribution function (IEDF) is vital for advanced plasma processing applications. Capacitively coupled plasma (CCP) discharges excited using non-sinusoidal waveform have shown its capability to control IEDF through…
Using particle-in-cell simulation technique, we investigate the plasma and ionization asymmetry, electron and ion energy distribution function in capacitive discharges excited by tailored waveforms. At a base frequency of 13.56 MHz, three…
In atmospheric pressure capacitively coupled microplasma jets, Voltage Waveform Tailoring (VWT) was demonstrated to provide ultimate control of the Electron Energy Distribution Function (EEDF), which allows to enhance and adjust the…
Control over plasma asymmetry in a low-pressure capacitively coupled plasma (CCP) discharges is vital for many plasma processing applications. In this article, using the particle-in-cell simulation technique, we investigated the asymmetry…
Recent experimental techniques in multicolor waveform synthesis allow the temporal shaping of strong femtosecond laser pulses with applications in the control of quantum mechanical processes in atoms, molecules, and nanostructures.…
Sawtooth control using steerable electron cyclotron current drive (ECCD) has been demonstrated in ASDEX Upgrade plasmas with a significant population of energetic ions in the plasma core and long uncontrolled sawtooth periods. The sawtooth…
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In this work, a low frequency (100 kHz) tailored…
A self-consistent 1-D model was developed to study the effect of the electron energy distribution function (EEDF) on power deposition and plasma density profiles in a planar inductively coupled plasma (ICP) in the non-local regime (pressure…
We propose a method to generate a single peak at a distinct energy in the ion flux-energy distribution function (IDF) at the electrode surfaces in capacitively coupled plasmas. The technique is based on the tailoring of the driving voltage…
An independent control of the flux and energy of ions impacting on an object immersed in a plasma is often desirable for many industrial processes such as microelectronics manufacturing. We demonstrate that a simultaneous control of these…
A self-consistent particle-in-cell simulation study is performed to investigate the effect of driving frequency on the electric field non-linearity, electron heating mechanism and electron energy distribution function (EEDF) in a low…
Understanding electron and ion heating phenomenon in capacitively coupled radio-frequency plasma discharges is vital for many plasma processing applications. In this article, using particle-in-cell simulation technique we investigate the…
One dimensional fluid/electron Monte Carlo simulations of capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms are performed as a function of the number of consecutive harmonics driving frequencies of 13.56 MHz, N…
The behavior of capacitive coupled plasma (CCP) discharges is investigated in a mildly magnetized regime, defined by the condition 1 $\leq$ $f_{ce}/f_{rf}$ $\lt$ 2, where $f_{ce}$ and $f_{rf}$ are the cyclotron and radio-frequencies (RF),…
The electron dynamics and SiO2 etching profile evolution in capacitively coupled Ar/CHF3 plasmas driven by sawtooth-waveforms are investigated based on a one-dimensional fluid/Monte-Carlo (MC) model coupled with an etching profile evolution…
The electron dynamics and the mechanisms of power absorption in radio-frequency (RF) driven, magnetically enhanced capacitively coupled plasmas (MECCPs) at low pressure are investigated. The device in focus is a geometrically asymmetric…
This work investigates the discharge properties of a cylindrical magnetized capacitive coupled plasma discharge produced between a pair of coaxial cylinders. For the purpose of diagnosing plasma properties and electron energy distribution…
A numerical tool for analysing spatially anisotropic electron populations in electron cyclotron resonance (ECR) plasmas has been developed, using a trial-and-error electron energy distribution function (EEDF) fitting method. The method has…
The control of fluctuations generated in an electron cyclotron resonance (ECR) plasma is attempted by changing microwave powers. It is found that when a cage is introduced in the vacuum chamber, the fluctuations change from turbulent state…
The highly advanced treatment of surfaces as etching and deposition is mainly enabled by the extraordinary properties of technological plasmas. The primary factors that influence these processes are the flux and the energy of various…