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High-Power Impulse Magnetron Sputtering (HiPIMS) offers higher ionized flux fractions at the cost of lower deposition rates compared to conventional DCMS. A fine optimization of the deposition conditions is crucial for specific…
High-power impulse magnetron sputtering (HiPIMS) delivers a high target power in short pulses, enhancing the ionization and energy of sputtered atoms and providing thus more possibilities to control the film properties. This study explores…
Deposition of thin films that are resistant to aggressive environment conditions, using the High-power impulse magnetron sputtering (HIPIMS) technique, represents a technological challenge. To establish the optimal operating conditions it…
The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films.…
A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the…
Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35mm, 60mm, and 100mm) was carried out during long positive voltage pulses (a duration of 500$\mu$s and a preset positive voltage…
The discharges in high power impulse magnetron sputtering (HiPIMS) have been reported to consist of azimuthally inhomogeneous plasma with locally increased light emission. The luminous zones seemingly travel around the racetrack and are…
We present a detailed investigation of the afterpulse effect in silicon photomultipliers (SiPMs), using a dedicated structure with single-cell readout. This enables direct measurement of intrinsic device properties and observation of…
The transport of sputtered species from the target of a magnetron plasma to a collecting surface at the circumference of the plasma is analyzed using a particle tracer technique. A small chromium insert at the racetrack position inside a…
Magnetron sputtering is a widely used physical vapor deposition technique. Reactive sputtering is used for the deposition of, e.g, oxides, nitrides and carbides. In fundamental research, versatility is essential when designing or upgrading…
We present a comparative study of copper film growth with a constant energy neutral beam, thermal evaporation, dc magnetron sputtering, high-power impulse magnetron sputtering (HiP-IMS), and bipolar HiPIMS, through molecular dynamics…
In this work, coupled optical and electrical discharge measurements have been implemented to investigate the plasma state of a reactive HiPIMS TiO$_2$ deposition process running at a fixed duty cycle of 2% and at a repetition rate of 1 kHz.…
The hybrid light-matter character of exciton-polaritons gives rise to distinct polariton parametric scattering (PPS) process, which holds promise for frontier applications in polaritonic quantum devices. However, the stable excitation and…
Simulations of thin film sputter deposition require the separation of the plasma and material transport in the gas-phase from the growth/sputtering processes at the bounding surfaces. Interface models based on analytic expressions or…
The characterization of the electronic structure and chemical states of gases, solids, and liquids can be effectively performed using ambient pressure X-ray photoelectron spectroscopy (AP-XPS). However, the acquisition of electronic and…
Plasma impedance probes (PIPs) are a type of RF probe that primarily measure electron density. This work introduces two advancements: a streamlined analytical model for interpreting PIP-monopole measurements and techniques for achieving…
This paper presents a novel approach using multiple linear regression to process transient signals from silicon photomultipliers. The method provides excellent noise suppression and pulse detection in scenarios with a high pulse count rate…
This paper proposes an automatic procedure, based on ROOT data Analysis Framework, for the analysis of Silicon Photomultipliers (SiPM) characteristics. In particular, it can be used to analyze experimental waveforms, from oscilloscope,…
HiPIMS plasmas generate energetic metal ions at the substrate as a major difference to conventional direct current magnetron sputtering. The origin of these ions is still an open issue, which is unraveled by using two fast diagnostics: time…
Polynomial interpolation is an important component of many computational problems. In several of these computational problems, failure to preserve positivity when using polynomials to approximate or map data values between meshes can lead…