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One dimensional fluid/electron Monte Carlo simulations of capacitively coupled Ar/O2 discharges driven by sawtooth up voltage waveforms are performed as a function of the number of consecutive harmonics driving frequencies of 13.56 MHz, N…
Control over plasma asymmetry in a low-pressure capacitively coupled plasma (CCP) discharges is vital for many plasma processing applications. In this article, using the particle-in-cell simulation technique, we investigated the asymmetry…
Using particle-in-cell simulation technique, we investigate the plasma and ionization asymmetry, electron and ion energy distribution function in capacitive discharges excited by tailored waveforms. At a base frequency of 13.56 MHz, three…
Low-pressure radio-frequency capacitively coupled plasmas operated in Ar/O$_2$ gas mixtures are widely adopted in critical semiconductor manufacturing processes. O($^3$P) and O($^1$D) are key highly reactive species for oxidation or as…
Tailoring ion energy distribution function (IEDF) is vital for advanced plasma processing applications. Capacitively coupled plasma (CCP) discharges excited using non-sinusoidal waveform have shown its capability to control IEDF through…
A particle-in-cell (PIC) simulation study is performed to investigate the discharge asymmetry, higher harmonic generations and electron heating mechanism in a low pressure very high frequency capacitively coupled plasma (CCP) excited by a…
Understanding electron and ion heating phenomenon in capacitively coupled radio-frequency plasma discharges is vital for many plasma processing applications. In this article, using particle-in-cell simulation technique we investigate the…
In capacitively coupled radio frequency (CCRF) discharges, the interaction of the plasma and the surface boundaries is linked to a variety of highly relevant phenomena for technological processes. One possible plasma-surface interaction is…
A self-consistent particle-in-cell simulation study is performed to investigate the effect of driving frequency on the electric field non-linearity, electron heating mechanism and electron energy distribution function (EEDF) in a low…
Based on two-dimensional particle-in-cell simulations a novel approach towards Electron Energy Probability Function (EEPF) and plasma chemistry control by Current Waveform Tailoring (CWT) in the coil of inductively coupled discharges is…
Using particle-in-cell (PIC) simulation technique, the effect of gas pressure (5-500 mTorr) on the plasma spatial asymmetry, ionization rate, metastable gas densities profile, electron energy distribution function and higher harmonics…
Precise control of ion energy distribution functions (IEDF) is crucial for selectivity as well as control over sputter rate and substrate damage in nanoscale plasma processes. In this work, a low frequency (100 kHz) tailored…
Very high frequency (VHF) driven capacitive discharges are now being increasingly adopted for plasma-based materials processing due to their high processing rates and lower substrate damage. Past studies related to complex plasma dynamics…
In this work, we analyze the creation of the discharge asymmetry and the concomitant formation of the DC self-bias voltage in capacitively coupled radio frequency plasmas driven by multi-frequency waveforms, as a function of the electrode…
The Electron Cyclotron Drift Instability (ECDI) driven by the electron $E\times B$ drift in partially magnetized plasmas is investigated with highly resolved particle-in-cell simulations. The emphasis is on two-dimensional effects involving…
Phonon measurements in the A15-type superconductors were complicated in the past because of the unavailability of large single crystals for inelastic neutron scattering, e.g., in the case of Nb$_3$Sn, or unfavorable neutron scattering…
In atmospheric pressure capacitively coupled microplasma jets, Voltage Waveform Tailoring (VWT) was demonstrated to provide ultimate control of the Electron Energy Distribution Function (EEDF), which allows to enhance and adjust the…
Plasma etching, a critical process in semiconductor fabrication, utilizes hydrofluorocarbons both as etchants and as precursors for carbon film formation, where precise control over film growth is essential for achieving high…
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial…
A two-dimensional fluid model is used to investigate the electron heating dynamics and the production of neutral species in a capacitively coupled radio-frequency micro atmospheric pressure helium plasma jet -- specifically the COST jet --…