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The improvement in observational facilities requires refining the modelling of the geometrical structures of astrophysical objects. Nevertheless, for complex problems such as line overlap in molecules showing hyperfine structure, a detailed…
In this work multilevel pattering capabilities of Substrate Conformal Imprint Lithography (SCIL) have been explored. A mix & match approach combining the high throughput of nanoimprint lithography with the excellent overlay accuracy of…
We develop a new spatial semidiscrete multiscale method based upon the edge multiscale methods to solve semilinear parabolic problems with heterogeneous coefficients and smooth initial data. This method allows for a cheap spatial…
In many imaging applications where segmented features (e.g. blood vessels) are further used for other numerical simulations (e.g. finite element analysis), the obtained surfaces do not have fine resolutions suitable for the task. Increasing…
This study explores the use of photometric techniques (shape-from-shading and uncalibrated photometric stereo) for upsampling the low-resolution depth map from an RGB-D sensor to the higher resolution of the companion RGB image. A…
Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metastable atom lithography with binary…
Multimode interference reflectors (MIRs) were recently introduced as a new type of photonic integrated devices for on-chip, broadband light reflection. In the original proposal, different MIRs were demonstrated based on total internal…
Diffractive lenses have recently been applied to the domain of multispectral imaging in the X-ray and UV regimes where they can achieve very high resolution as compared to reflective and refractive optics. Conventionally, spectral…
The question of interest in the present study is: ``Given a body subject to mechanical loads, how to define the initial geometry so that the deformed one matches precisely a prescribed shape?'' This question is particularly relevant in…
This work presents a new super-resolution imaging approach by using subwavelength hole resonances. We employ a subwavelength structure in which an array of tiny holes are etched in a metallic slab with the neighboring distance $\ell$ that…
Optical metasurfaces (subwavelength-patterned surfaces typically described by variable effective surface impedances) are typically modeled by an approximation akin to ray optics: the reflection or transmission of an incident wave at each…
In some super-resolution techniques, adjacent points are illuminated at different times. Thereby, their locations and light intensities can be detected even if the images are very blurred due to diffraction. According to conventional…
All coronagraphic instruments for exoplanet high-contrast imaging need wavefront correction systems to reject optical aberrations and create sufficiently dark holes. Since the most efficient wavefront correction algorithms (controllers and…
In semiconductor manufacturing, lithography has often been the manufacturing step defining the smallest possible pattern dimensions. In recent years, progress has been made towards high-NA (Numerical Aperture) EUVL…
We introduce a rapid data acquisition and reconstruction method to image the crystalline structure of materials and associated strain and orientations at micrometer resolution using Laue diffraction. Our method relies on scanning a…
A semi-analytical computational algorithm to model the wavefield generated by paraxial diffraction of a class of Laguerre-Gauss beams by sharp-edge elliptic apertures is here developed. Thanks to such a powerful computational tool, some…
Mapping the boundary of an extended source is a key step in the study of its morphology. The background contamination and statistical fluctuations of typical astronomical images make this a challenging statistical task, particularly for…
A solution to the inversion problem of scattering would offer aberration-free diffraction-limited 3D images without the resolution and depth-of-field limitations of lens-based tomographic systems. Powerful algorithms are increasingly being…
The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3…
The boundary problem of linear classical optics about the interaction of electromagnetic radiation with a thin dielectric film has been solved under explicit consideration of its discrete structure. The main attention has been paid to the…