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Planar germanium is currently the only semiconducting platform where high-coherence spin qubits and proximity-induced superconductivity have each been demonstrated. Recent research into spin qubits in Ge/SiGe heterostructures has focused on…

Low-defect-density Ge thin films are critical in Ge based optical devices (optical detectors, LEDs and Lasers) integrated with Si electronic devices for low-cost, highly integrated photonic circuits. In this work, Ge thin films prepared by…

Applied Physics · Physics 2022-10-18 Liming Wang , Guangrui Xia

Defects in semiconductors have recently attracted renewed interest owing to their potential in novel quantum applications. Here we investigate the electronic and magnetic properties induced by 60{\deg} dislocations in Ge. Using large-scale…

We address nonradiative recombination pathways by leveraging surface passivation and dislocation management in micron-scale arrays of Ge crystals grown on deeply patterned Si substrates. The time decay photoluminescence (PL) at cryogenic…

We introduce a decomposition method for the distributed calculation of exact Euclidean Minimum Spanning Trees in high dimensions (where sub-quadratic algorithms are not effective), or more generalized geometric-minimum spanning trees of…

Distributed, Parallel, and Cluster Computing · Computer Science 2024-06-05 Richard Lettich

We present a theory of the graphene nanoslide, a fundamental device for graphene straintronics that realizes a single pseudogauge barrier. We solve the scattering problem in closed form and demonstrate that the nanoslide gives rise to a…

Mesoscale and Nanoscale Physics · Physics 2026-05-18 Christophe De Beule , Ming-Hao Liu , Bart Partoens , Lucian Covaci

Two-dimensional (2D) layered tungsten diselenides (WSe2) material has recently drawn a lot of attention due to its unique optoelectronic properties and ambipolar transport behavior. However, direct chemical vapor deposition (CVD) synthesis…

Materials Science · Physics 2014-12-18 Liang Chen , Bilu Liu , Ahmad N. Abbas , Yuqiang Ma , Xin Fang , Yihang Liu , Chongwu Zhou

Nano-scale eutectics, such as rapid solidified Al-Si, exhibit enhanced yield strength and strain hardening but plasticity is limited by cracking of the hard phase (Si). Mechanisms that may suppress cracking and enable plastic co-deformation…

Materials Science · Physics 2023-09-04 Arkajit Ghosh , Wenqian Wu , Bibhu Prasad Sahu , Jian Wang , Amit Misra

We demonstrate high-quality epitaxial germanium (Ge) films on a metallic silicide, Fe3Si, grown directly on a Ge(111) substrate. Using molecular beam epitaxy techniques, we can obtain an artificially controlled arrangement of silicon (Si)…

Materials Science · Physics 2012-10-04 S. Yamada , K. Tanikawa , M. Miyao , K. Hamaya

The strain field of a dislocation emerging at a free surface is partially relaxed to ensure stress free boundary conditions. We show that this relaxation strain at the outcrop of edge threading dislocations in GaN{0001} gives rise to a…

Materials Science · Physics 2018-04-04 Vladimir M. Kaganer , Karl K. Sabelfeld , Oliver Brandt

Dislocations are one-dimensional (1D) topological line defects where the lattice deviates from the perfect crystal structure. The presence of dislocations transcends condensed matter research and gives rise to a diverse range of emergent…

In this article, the results of investigation of processes occurring during the molecular-beam deposition of germanium layers on Si$_3$N$_4$ dielectric substrates within a wide range of the Ge film growth temperatures (30 to 600{\deg}C) are…

We apply a multiscale modeling approach to study lattice reconstruction in marginally twisted bilayers of transition metal dichalcogenides (TMD). For this, we develop DFT-parametrized interpolation formulae for interlayer adhesion energies…

Mesoscale and Nanoscale Physics · Physics 2020-05-21 V. V. Enaldiev , V. Zólyomi , C. Yelgel , S. J. Magorrian , V. I. Fal'ko

Germanosilicides, especially those formed on compressive substrates, are less stable than silicides against agglomeration. By studying the solid-state reaction of Ni thin film on strained Si0.8Ge0.2(001), we show that nickel germanosilicide…

Materials Science · Physics 2007-05-23 H. B. Yao , M. Bouville , D. Z. Chi , H. P. Sun , X. Q. Pan , D. J. Srolovitz , D. Mangelinck

The yield surface in crystal plasticity can be approached from various directions during mechanical loading. We consider the competition between nanoindentation and tensile loading towards plastic yielding. For this purpose, we develop a…

Materials Science · Physics 2017-07-14 Hengxu Song , Hakan Yavas , Erik Van der Giessen , Stefanos Papanikolaou

We grow $^{28}$Si/SiGe heterostructures by reduced-pressure chemical vapor deposition and terminate the stack without an epitaxial Si cap but with an amorphous Si-rich layer obtained by exposing the SiGe barrier to dichlorosilane at 500…

Mesoscale and Nanoscale Physics · Physics 2022-05-18 Davide Degli Esposti , Brian Paquelet Wuetz , Viviana Fezzi , Mario Lodari , Amir Sammak , Giordano Scappucci

Low energy alkali ion scattering is used to investigate the deposition of Au onto a single layer of graphene grown onto Ni(111) by chemical vapor deposition. The yield of 3.0 keV Na$^+$ singly scattered from Au as a function of coverage…

Mesoscale and Nanoscale Physics · Physics 2018-12-26 Jory A. Yarmoff , Christopher Salvo

Nanowire (NW) arrays form spontaneously after high temperature annealing of a submonolayer deposition of Pt on a Ge(001) surface. These NWs are a single atom wide, with a length limited only by the underlying beta-terrace to which they are…

Materials Science · Physics 2013-11-15 Danny E. P. Vanpoucke , Geert Brocks

We have selectively grown thin epitaxial GaAs films on Ge substrates with the aid of a 200 nm thin SiO2 mask layer. The selectively grown structures have lateral sizes ranging from 1 um width up to large areas of 1 by 1 mm2. The growth is…

Materials Science · Physics 2007-05-23 G. Brammertz , M. Caymax , Y. Mols , S. Degroote , M. Leys , J. Van Steenbergen , G. Winderickx , G. Borghs , M. Meuris

The present work illustrates a novel approach for the maskless and resistless fabrication of nanopatterned metal layers on Si substrates, based on the combination of nanomechanical surface modification techniques (such as nanoindentation…

Applied Physics · Physics 2023-07-18 R. Cecchini , A. Fabrizi , C. Paternoster , W. Zhang , G. Roventi