Related papers: Ordered topographically patterned silicon by insec…
We present a comprehensive study on the formation of micrometer-sized, textured hexagonal diamond silicon (hd-Si) crystals via nanoindentation followed by annealing. Utilizing advanced characterization techniques such as polarized Raman…
We report on the production of ordered assemblies of silicon nanostructures by means of irradiation of a Si(100) substrate with 1.2 keV Ar ions at normal incidence. Atomic Force and High-Resolution Transmission Electron microscopies show…
Electrospun poly(\epsilon-caprolactone) (PCL)nanofibrous mats are widely considered for blood-contacting wound dressings and small-diameter vascular applications; however, their intrinsic hydrophobicity limits rapid wetting and controlled…
Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~ 30 nm pitch using electron beam lithography. Our work demonstrates…
Nowadays, microelectronics and nanoelectronics require the search for new materials, including masks for creating structures. Today, the intermediate hard mask strategy is one of the key issues in achieving a good balance between…
We demonstrate the possibility of growing textured La$_{2/3}$Sr$_{1/3}$MnO$_3$ (LSMO) thin films on silicon substrates with magneto-optical and optical properties comparable to high-quality epitaxial layers grown on bulk SrTiO$_3$ (STO).…
Topological insulators (TIs) are exotic materials which have topologically protected states on the surface due to the strong spin-orbit coupling. However, a lack of ordered growth of TI thin films on amorphous dielectrics and/or insulators…
We demonstrate a mechanochemical approach to fabrication of a bidirectional surface on a doped silicon wafer. In the initial step of our fabrication procedure, a high-density polyethylene (HDPE) stylus is pressed and drawn on the Si…
We report an optimized two-step thermopolymerization process carried out in contact with micropatterned molds that yields porous phenolic resin dual-use stamps with topographically micropatterned contact surfaces. With these stamps, two…
Controlled atomic scale fabrication of functional devices is one of the holy grails of nanotechnology. The most promising class of techniques that enable deterministic nanodevice fabrication are based on scanning probe patterning or surface…
Structuring Si in arrays of vertical high aspect ratio pillars, ranging from nanoscale to macroscale feature dimensions, is essential for producing functional interfaces for many applications. Arrays of silicon 3D nanostructures are needed…
Iron phthalocyanine (FePc) molecules were investigated on the topological insulator surface Bi2Se3 using scanning tunneling microscopy (STM) and spectroscopy (STS) at 77 K in ultra high vacuum (UHV). Sub-molecular resolution STM images…
Nonlinear nanophotonic waveguides have opened a route to compact frequency combs for precision metrology, spectroscopy and astronomy, yet broadband comb access to the visible remains challenging on CMOS-compatible platforms. Silicon nitride…
We show how anisotropic, grooved features facilitate the trapping and directed transport of droplets on lubricated, liquid-shedding surfaces. Capillary action pins droplets to topographic surface features, enabling transport along the…
In many natural multi-layered composites, such as in the dactyl club of Stomatopods or the shell of bivalve mollusks, the defining functional and structural properties are determined by locally varying orientations of inorganic building…
We report the growth of Si nanostructures, either as thin films or nanoparticles, on graphene substrates. The Si nanostructures are shown to be single crystalline, air stable and oxidation resistive, as indicated by the observation of a…
In this study, we fabricate 5-30-nm-thick films of FeSe/STO using pulsed laser deposition (PLD). The grown films exhibit superconductivity with an onset $T_{\mathrm{c}}$ that is much higher than that of bulk FeSe under ambient pressure. The…
Anisotropic etching is a widely used process in semiconductor manufacturing, in particular for micro- and nano-scale texturing of silicon surfaces for black silicon production. The typical process of plasma-assisted etching uses energetic…
Highly oriented pyrolytic graphite (HOPG) was scribed by pulsed laser beam to produce square patterns. Patterning of HOPG surface facilitates the detachment of graphene layers during contact printing. Direct HOPG-to-substrate and…
Sequential infiltration synthesis (SIS) provides an original strategy to grow inorganic materials by infiltrating gaseous precursors in polymeric films. Combined with micro-phase separated nanostructures resulting from block copoly-mer…