Related papers: A comparative study of resists and lithographic to…
Lithography simulation is one of the key steps in physical verification, enabled by the substantial optical and resist models. A resist model bridges the aerial image simulation to printed patterns. While the effectiveness of learning-based…
This publication presents an investigation of the performance of different analytical electron ptychography methods for low-dose imaging. In particular, benchmarking is performed for two model-objects, monolayer MoS$_2$ and apoferritin, by…
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
We experimentally map the transverse profile of diffraction-limited beams using photon-number-resolving detectors. We observe strong compression of diffracted beam profiles for high detected photon number. This effect leads to higher…
We explore possibilities of waveguide-mode interference lithography (WMIL) technique for high contrast subwavelength structures in the visible region. Selecting an appropriate waveguide-mode, we demonstrate high contrast resist mask…
Laser Interference Lithography (LIL) is a versatile fabrication method for patterning sub-micron structures in arrays covering large areas. It is a facile and fast mask-less lithography process to produce large area periodic patterns. The…
Pattern transfer by deep anisotropic etch is a well-established technique for fabrication of nanoscale devices and structures. For this technique to be effective, the resist material plays a key role and must have high resolution,…
Creating arbitrary light patterns finds applications in various domains including lithography, beam shaping, metrology, sensing and imaging. We study the formation of high-contrast light patterns that are obtained by transmission through an…
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…
We introduce an in-situ characterization method of resists used for e-beam lithography. The technique is based on the application of an atomic force microscope which is directly mounted below the cathode of an electron-beam lithography…
Reflectometry is a technique that uses the light reflected by a sample to determine properties of the sample. Interferometric reflectometry uses interference between two beams, one of which is incident on ---and reflected back by--- a…
Iodinated contrast media is essential for dual-energy computed tomography (DECT) angiography. Previous studies show that iodinated contrast media may cause side effects, and the interruption of the supply chain in 2022 led to a severe…
This work aims to demonstrate that two arrays of Lumped Element Kinetic Inductance Detectors (LEKIDs), when employed in filled array configuration and separated by an external linear polarizer oriented at 45 degrees, can achieve the…
This study investigates the convergence properties of a collection of iterative electron ptychography methods, under low electron doses ($<$ 10$^3$ $e^-/A^2$) and gives particular attention to the impact of the user-defined update…
We present methods and results of the testing of an inexpensive home-made diffraction limited lens system, the design of which was proposed in a recent paper and which has since been used (with slight alterations) by several research…
Millimetre-wave observations represent an important tool for Cosmology studies. The Line Intensity Mapping (LIM) technique has been proposed to map in three dimensions the specific intensity due to line (e.g. [CII], CO) emission, for…
We study the homogenisation of geometrically nonlinear elastic composites with high contrast. The composites we analyse consist of a perforated matrix material, which we call the "stiff" material, and a "soft" material that fills the pores.…
High-resolution patterning of periodic structures over large areas has several applications in science and technology. One such method, based on the long-known Talbot effect observed with diffraction gratings, is achromatic Talbot…
In this work we consider the inverse problem of reconstructing the optical properties of a layered medium from an elastography measurement where optical coherence tomography is used as the imaging method. We hereby model the sample as a…
We describe the Phase-Contrast Imaging instrument at the Matter in Extreme Conditions (MEC) endstation of the Linac Coherent Light Source. The instrument can image phenomena with a spatial resolution of a few hundreds of nanometers and at…