Related papers: Hyper-lithography
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
Miniaturizing nonlinear optical components is essential for integrating advanced light manipulation into compact photonic devices, enabling scalable and cost-effective applications. While monocrystalline lithium niobate thin films advance…
Artificial nanostructures with ultrafine and deep-subwavelength feature sizes have emerged as a paradigm-shifting platform to advanced light field management, becoming a key building block for high-performance integrated optoelectronics and…
Colloidal lithography has emerged as a promising alternative to conventional nanofabrication techniques, offering the ability to create nanoscale patterns in a cost-effective and scalable manner. However, it has been so far limited by…
Silicon nanostructuring imparts unique material properties including antireflectivity, antifogging, anti-icing, self-cleaning, and/or antimicrobial activity. To tune these properties however, a good control over features size and shape is…
We report on the fabrication of two-dimensional periodic photonic nanostructures by nanoimprint lithography and dry etching, and their integration into a 1-{\mu}m-thin mono-crystalline silicon solar cell. Thanks to the periodic…
The fabrication of functional metamaterials with extreme feature resolution finds a host of applications such as the broad area of surface/light interaction. Non-planar features of such structures can significantly enhance their performance…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
We propose a laser interference nano-lithography technique for fabrication of nano-structures. This is inspired by a 2pi-illumination system that consists of two cylindrical lens arranged face-to-face at a distance 2f with a common…
The integration of nanoscale electronics with conventional optical devices is restricted by the diffraction limit of light. Metals can confine light at the subwavelength scales needed, but they are lossy, while dielectric materials do not…
Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~ 30 nm pitch using electron beam lithography. Our work demonstrates…
Despite the steady advancements in nanofabrication made over the past decade that had prompted a plethora of intriguing applications across various fields, achieving compatibility between miniaturized photonic devices and electronic…
The photo-kinetics of fluorescent molecules have enabled the circumvention of far-field optical diffraction-limit. Despite its enormous potential, the necessity to label the sample may adversely influence the delicate biology under…
The ability to fabricate anisotropic superconducting layers a la carte is desired in technologies such as fluxon screening or removal in field-resilient devices, flux lensing in ultra-sensitive sensors, or in templates for imprinting…
High-index dielectrics can confine light into nano-scale leading to enhanced nonlinear response. However, increased momentum in these media can deteriorate the overlap between different harmonics which hinders efficient nonlinear…
Integration of complex photonic structures onto optical fiber facets enables powerful platforms with unprecedented optical functionalities. Conventional nanofabrication technologies, however, do not permit viable integration of complex…
While conventional optical trapping techniques can trap objects with submicron dimensions, the underlying limits imposed by the diffraction of light generally restrict their use to larger or higher refractive index particles. As the index…
Efficient machine learning inference is essential for the rapid adoption of artificial intelligence across various domains.On-chip optical computing has emerged as a transformative solution for accelerating machine learning tasks, owing to…
We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were…
To overcome the limit of diffraction while achieving the superresolution technique, solid immersion lenses are the key optical elements for data storage and nanophotonics applications. Recent demonstrations have shown how different…