Related papers: Self-bias Dependence on Process Parameters in Asym…
The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including…
In this work, we analyze the creation of the discharge asymmetry and the concomitant formation of the DC self-bias voltage in capacitively coupled radio frequency plasmas driven by multi-frequency waveforms, as a function of the electrode…
With an implicit Particle-in-cell/Monte Carlo model, capacitively coupled plasmas are studied in two-dimensional and axisymmetric geometry. Self-bias dc voltage effects are self-consistently considered. Due to finite length effects, the…
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial…
In this work negative-ion production on the surface of a sample negatively DC biased in a hydrogen plasma is studied. The negative ions created under the positive ion bombardment are accelerated towards the plasma, self-extracted and…
We propose a theoretical ground for emissive capacitively coupled radio-frequency plasma sheath under low pressure. The rf sheath is assumed to be collisionless, and oscillates with external source. A known sinusoidal voltage instead of…
The understanding of the Ar/Cl2 plasma etching mechanism is crucial for the desired modification of inner surface of the three dimensional niobium (Nb) superconductive radio frequency cavities. Uniform mass removal in cylindrical shaped…
In geometrically symmetric capacitive radio-frequency plasmas driven by two consecutive harmonics a dc self-bias can be generated as a function of the phase shift between the driving frequencies via the Electrical Asymmetry Effect (EAE).…
We perform experiments in the Large Plasma Device (LAPD) at the University of California, Los Angeles, studying how different end-electrode biasing schemes modify the radial potential profile in the machine. We impose biasing profiles of…
An interesting aspect in the research of complex (dusty) plasmas is the experimental study of the interaction of micro-particles with the surrounding plasma for diagnostic purposes. Local electric fields can be determined from the behaviour…
The dynamical characteristics of a single frequency low pressure capacitively coupled plasma (CCP) device under varying applied RF voltages and driving frequencies are studied using particle-in-cell/Monte Carlo collision simulations. An…
Biased electrodes are common components of plasma sources and diagnostics. The plasma-electrode interaction is mediated by an intervening sheath structure that influences properties of the electrons and ions contacting the electrode…
Low-pressure multi-frequency capacitively coupled plasmas are used for numerous etch and deposition applications in the semiconductor industry. Pulsing of the radio-frequency (RF) sources enables control of neutral and charged species in…
An independent control of the flux and energy of ions impacting on an object immersed in a plasma is often desirable for many industrial processes such as microelectronics manufacturing. We demonstrate that a simultaneous control of these…
Equilibrating gravitation by electric forces, microparticles can be confined in the plasma sheath above suitably biased local electrodes.Their position depends on the detailed structure of the plasma sheath and on the charge that the…
The levitation height of a dust particle layer within a RF discharge plasma sheath is known to be related to the DC bias, the background pressure, and the Debye length. In this paper, a new experimental technique for measurement of the…
We investigate the discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma discharge with an axisymmetric magnetic field generating an EXB drift in the azimuthal direction. Vital…
We report a technique for applying a dc bias in a 3d microwave cavity. This is achieved by isolating the two halves of the cavity with a dielectric and directly using them as dc electrodes. By embedding a variable capacitance diode in the…
In this manuscript, a fluid model is utilized to calculate the density of plasma species assuming geometrically symmetric Ar/CF4 Radiofrequency Capacitively Coupled Plasmas. The electrodes are driven by a sinusoidal waefront with an…
Radiofrequency capacitively coupled plasma is studied theoretically using a Particle-in-Cell code. For He discharge, the time-averaged sheaths are in the range of few centimeters. The sheath potential, ion, and electron energy and angular…