Related papers: Etching Mechanism of Niobium in Coaxial Ar/Cl2 RF …
Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial…
An apparatus and a method are described for plasma etching of the inner surface of superconducting radio frequency (SRF) cavities. Accelerator SRF cavities are formed into a variable-diameter cylindrical structure made of bulk niobium, for…
Niobium nitride (NbN) is a metallic superconductor that is widely used for superconducting electronics due to its high transition temperature ($T_c$) and kinetic inductance. Processing-induced damage negatively affects the performance of…
The main goal of this research was to determine the key reagents during the highly Si3N4/SiO2 selective etching. The experiments were conducted, where both Si3N4 and SiO2 samples were etched by NF3/O2 and NF3/O2/N2/H2 plasmas. The sources…
An rf coaxial capacitively coupled Ar/Cl2 plasma is applied to processing the inner wall of superconducting radio frequency cavities. A dc self-bias potential is established across the inner electrode sheath due to the surface area…
Discharge structure refers to the morphology of different plasma quantities, such as electron temperature, reaction rate, plasma potential, mass flux, net charge and species density, which are determined by plasma transport mechanism and…
We report a reproducible technique for the fabrication of sharp superconducting Nb tips for scanning tunneling microscopy (STM) and scanning tunneling spectroscopy. Sections of Nb wire with 250 $\mu$m diameter are dry etched in an SF$_6$…
Plasma etching, a critical process in semiconductor fabrication, utilizes hydrofluorocarbons both as etchants and as precursors for carbon film formation, where precise control over film growth is essential for achieving high…
The reduction of the asymmetry in the plasma sheath voltages of a cylindrical coaxial capacitively coupled plasma is crucial for efficient surface modification of the inner surfaces of concave three-dimensional structures, including…
Three-dimensional (3D) etching of materials by plasmas is an ultimate challenge in microstructuring applications. A method is proposed to reach a controllable 3D structure by using masks in front of the surface in a plasma etch reactor in…
Ion nitriding and ion carburising by plasma discharges are promising techniques in order to modify the surface of austenitic steels. Plasma treatments improve mechanical properties, e.g., hardness and wear resistance. Indeed, these…
Inductively Coupled Plasma (ICP) etching of amorphous silicon (a-Si) nanostructures using a continuous C4F8/SF6 plasma over nanotopography in silicon dioxide (SiO2) is investigated. The coil power of the ICP system is used to tune the a-Si…
In this manuscript, a fluid model is utilized to calculate the density of plasma species assuming geometrically symmetric Ar/CF4 Radiofrequency Capacitively Coupled Plasmas. The electrodes are driven by a sinusoidal waefront with an…
Nitrogen doping treatment with the subsequent electropolishing (EP) of the niobium superconducting cavity can significantly increase the cavity's quality factor up to a factor of 3. But the process of the EP removal may reintroduce hydrogen…
An accurate knowledge of the scattering length is fundamental in ultracold quantum gas experiments and essential for the characterisation of the system as well as for a meaningful comparison to theoretical models. Here, we perform a careful…
Averaged plasma parameters such as electron distribution function and electron density are determined by characterization of high frequency (2.4 GHz) nitrogen-plasma using both experimental methods, namely optical emission spectroscopy…
A time-dependent multi-temperature quenching model at atmospheric pressure, incorporating chemical and vibrational kinetics, is introduced. The model provides insights into the pathways of NOx formation and destruction in the downstream…
Materials imperfections in Nniobium based superconducting quantum circuits, in particular, two-level-system (TLS) defects, are a major source of decoherence, ultimately limiting the performance of quantum computation and sensing. Thus,…
Niobium does not show any structure transition up to very high pressures. Nonetheless, by using density functional theory, we demonstrate in this work that it exhibits striking softening in elastic moduli C44 and C' at a pressure from 20 to…
Group-V materials such as niobium and tantalum have become popular choices for extending the performance of circuit quantum electrodynamics (cQED) platforms allowing for quantum processors and memories with reduced error rates and more…