Related papers: Exploring the temporally resolved electron density…
We use Raman spectroscopy to show that exposing few-layer graphene to extreme ultraviolet (EUV, 13.5 nm) radiation, i.e. relatively low photon energy, results in an increasing density of defects. Furthermore, exposure to EUV radiation in a…
We present the results of spectroscopic measurements in the extreme ultraviolet (EUV) regime (7-17 nm) of molten tin microdroplets illuminated by a high-intensity 3-J, 60-ns Nd:YAG laser pulse. The strong 13.5 nm emission from this…
Absolute values of VUV-emission of a 2.45 GHz microwave-driven hydrogen discharge are reported. The measurements were performed with a robust and straightforward method based on a photodiode and optical filters. It was found that the…
We present measurements of the pulse length of ultracold electron bunches generated by near-threshold two-photon photoionization of a laser-cooled gas. The pulse length has been measured using a resonant $3$ GHz deflecting cavity in…
The plasma-based acceleration is an encouraging technique to overcome the limits of the accelerating gradient in the conventional RF acceleration. A plasma accelerator is able to provide accelerating fields up to hundreds of $GeV/m$, paving…
We demonstrate laser-plasma acceleration of high charge electron beams to the ~10 MeV scale using ultrashort laser pulses with as little energy as 10 mJ. This result is made possible by an extremely dense and thin hydrogen gas jet. Total…
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2-$\mu$m-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse…
Electrons in an expanding ultracold plasma are expected to be in quasi-equilibrium, since the collision times are short compared to the plasma lifetime, yet we observe electrons evaporating out as the ion density decreases during expansion.…
Effects of radio-frequency power and driven frequency on the two-dimensional (axial and radial) distributions of electron density and temperature were experimentally investigated in low pressure capacitively coupled argon plasmas. The…
We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the $\lambda_{\mathrm{laser}} = 1.064 - 10.6 $ $\mu$m range. Detailed numerical simulations of laser-irradiated spherical tin…
It is generally believed that relativistically underdense plasma is transparent for intense laser radiation. However, particle-in-cell simulations reveal abnormal laser field absorption above the intensity threshold about~$3 \times…
Ultracold neutral plasmas are formed by photoionizing laser-cooled atoms near the ionization threshold. Through the application of atomic physics techniques and diagnostics, these experiments stretch the boundaries of traditional neutral…
Recent studies have demonstrated the possibility of accelerating electrons to MeV energies in ambient air using tightly focused laser configurations. In this article, we explore possible strategies to control and optimize the resulting…
We study the initial properties and positron annihilation within a small electron-positron plasma drop formed by intense laser pulse. Such QED cascade initiated plasma is, in general, far below the chemical (particle yield) equilibrium. We…
Plasma impedance probes (PIPs) are a type of RF probe that primarily measure electron density. This work introduces two advancements: a streamlined analytical model for interpreting PIP-monopole measurements and techniques for achieving…
Ultralow emittance ($\leq20$ nm, normalized) electron beams with $10^5$ electrons per bunch are obtained by tightly focusing an ultrafast ($\sim$ 100 fs) laser pulse on the cathode of a 1.6 cell radiofrequency photoinjector. Taking…
We discuss a concept of a point-like source of the extreme ultraviolet (EUV) light based on a non-equilibrium microwave discharge in expanding jet of dense xenon plasma with multiply charged ions. A conversion efficiency of microwave…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is shaped and…
A novel kind of electron beam sustained discharge is presented in which a 12keV electron beam is combined with a 2.45GHz microwave power to excite argon gas at atmospheric pressure in a continuous mode of operation. Optical emission…
In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is…