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With the integration of cellular networks in vertical industries that demand precise location information, such as vehicle-to-everything (V2X), public safety, and Industrial Internet of Things (IIoT), positioning has become an imperative…
Standard cell libraries are the foundation for the entire backend design and optimization flow in modern application-specific integrated circuit designs. At 7nm technology node and beyond, standard cell library design and optimization is…
Developing a group of machine cells and their corresponding part families to minimize the inter-cell and intra-cell material flow is the basic objective of the designing of a cellular manufacturing system (CMS). Afterwards achieving a…
The most direct definition of a patterning process' resolution is the smallest half-pitch feature it is capable of transferring onto the substrate. Here we demonstrate that thermal Scanning Probe Lithography (t-SPL) is capable of…
High quality standard cell layout automation in advanced technology nodes is still challenging in the industry today because of complex design rules. In this paper we introduce an automatic standard cell layout generator called NVCell that…
As an essential attribute of organic compounds, polarity has a profound influence on many molecular properties such as solubility and phase transition temperature. Thin layer chromatography (TLC) represents a commonly used technique for…
Advanced nodes decouple contacted poly pitch (CPP) and lower-metal pitch to improve routability. We present CPCell, an efficient standard-cell layout generation framework, to support arbitrary gear ratio (GR) and offset parameters through a…
Multi-die FPGAs are crucial components in modern computing systems, particularly for high-performance applications such as artificial intelligence and data centers. Super long lines (SLLs) provide interconnections between super logic…
Hyperspherical Prototypical Learning (HPL) is a supervised approach to representation learning that designs class prototypes on the unit hypersphere. The prototypes bias the representations to class separation in a scale invariant and known…
Tables are pervasive in diverse documents, making table recognition (TR) a fundamental task in document analysis. Existing modular TR pipelines separately model table structure and content, leading to suboptimal integration and complex…
The traditional paradigm to update retrieval models requires re-computing the embeddings of the gallery data, a time-consuming and computationally intensive process known as backfilling. To circumvent backfilling, Backward-Compatible…
Foundation model training is becoming multimodal, from post-training pipelines to large-scale pretraining. As modality coverage broadens, context windows grow, and encoder LLM scales diverge, a single LLM-centric TP/CP/PP/DP/EP layout…
Two-photon lithography (TPL) is a sophisticated additive manufacturing technology for creating three-dimensional (3D) micro- and nano-structures. Maintaining the health of TPL systems is critical for ensuring consistent fabrication quality.…
Accurate channel modeling has become critical for evaluating multiple-input multiple-output (MIMO) performance, especially as 5G standardization matures and efforts toward 6G begin. Recent studies within the 3rd Generation Partnership…
Large Language Models increasingly rely on distributed techniques for their training and inference. These techniques require communication across devices which can reduce scaling efficiency as the number of devices increases. While some…
Deterministic lateral displacement (DLD) is a popular technique for size-based separation of particles. One of the challenges in design of DLD chips is to eliminate the disturbance of fluid flow patterns caused by channel sidewalls…
3rd Generation Partnership Project (3GPP) Technical Report (TR) 38.901 channel models (Releases 15-19) are widely used for physical-layer design and system-level evaluation in dense urban outdoor-to-indoor (O2I) and indoor environments.…
General Text-to-3D (GT23D) generation is crucial for creating diverse 3D content across objects and scenes, yet it faces two key challenges: 1) ensuring semantic consistency between input text and generated 3D models, and 2) maintaining…
Direct-write multi-photon laser lithography (MPL) combines highest resolution on the nanoscale with essentially unlimited 3D design freedom. Over the previous years, the groundbreaking potential of this technique has been demonstrated in…
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes…