Related papers: Nanopatterning by Laser Interference Lithography: …
Measuring the diffuse, highly-ionized baryonic content in galactic halos and the intergalactic medium through soft x-ray absorption spectroscopy of active galactic nuclei is a main scientific objective of the Lynx X-ray Observatory mission…
In the field of optics, precise control of light with arbitrary spatial resolution has long been a sought-after goal. Freeform nanophotonic devices are critical building blocks for achieving this goal, as they provide access to a design…
The rapid development of metasurfaces - 2D ensembles of engineered nanostructures - is presently fostering a steady drive towards the miniaturization of many optical functionalities and devices to a subwavelength size. The material…
The ability to control the polarization of light at the extreme nanoscale has long been a major scientific and technological goal for photonics. Here we predict the phenomenon of polarization splitting through van der Waals heterostructures…
Successive ionic layer adsorption and reaction (SILAR) method is based on the adsorption and reaction of the ions in the cationic solution and the ionic solution, respectively. This method is simple, inexpensive, large-scale deposition,…
Lock-in Thermography (LIT) is a type of Infrared Thermography (IRT) that can be used as a useful non-destructive testing (NDT) technique for the detection of subsurface anomalies in objects. Currently, LIT fails to estimate the thickness at…
Artificial nanostructures with ultrafine and deep-subwavelength feature sizes have emerged as a paradigm-shifting platform to advanced light field management, becoming a key building block for high-performance integrated optoelectronics and…
Developing colloidal plasmonic nanomaterials with high carrier density that show optical resonances and photochemical activity extending from the visible to the mid-infrared (MIR) ranges remains a challenging pursuit. Here, we report the…
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its…
Extreme ultraviolet (EUV) lithography is the leading lithography technique in CMOS mass production, moving towards the sub-10 nm half-pitch (HP) regime with the ongoing development of the next generation high-numerical aperture (high-NA)…
Various nanostructured thin solid films on silicate based glass plates commonly used as substrates in contemporary vacuum technologies are studied. Evolution of mesostructured spiral and spiral crack patterns as a result of shrinkage or…
We theoretically demonstrate that increase of absorption with constant gain in laser systems can lead to onset of laser generation. This counter-intuitive absorption induced lasing (AIL) is explained by emergence of additional lasing modes…
Long-wave infrared (LWIR, 8-14 um) photonics is a rapidly growing research field within the mid-IR with applications in molecular spectroscopy and optical free-space communication. LWIR-applications are often addressed using rather bulky…
Embedding strong photonic stopbands into traditional optical fibre that can directly access and sense the outside environment is challenging, relying on tedious nanoprocessing steps that result in fragile thinned fibre. Ultrashort pulsed…
This work reports on the fabrication of microbump structures on Ni films by single-pulse, localized laser irradiation. Conditions for the reproducible formation of such microstructures have been identified in terms of laser-irradiation and…
Grayscale lithography allows the creation of micrometer-scale features with spatially-controlled height in a process that is fully compatible with standard lithography. Here, solid immersion lenses are demonstrated in silicon carbide using…
Lithography simulation is a critical step in VLSI design and optimization for manufacturability. Existing solutions for highly accurate lithography simulation with rigorous models are computationally expensive and slow, even when equipped…
The rise of micro/nanooptics and lab-on-chip devices demands the fabrication of three-dimensional structures with decent resolution. Here, we demonstrate the combination of grayscale electron beam lithography and direct forming methodology…
Off-axis X-ray holography is a lensless imaging technique that allows unambiguous retrieval of an object's exit-wave function with high fidelity. It has been used with great success to study nanoscale phenomena and spatio-temporal dynamics…
We report on the patterning and reduction of graphene-oxide films by holographic lithography. Light reduction can be used to engineer low-cost graphene-based devices by performing a local conversion of insulating oxide into the conductive…