Related papers: Nanopatterning by Laser Interference Lithography: …
A microscope based on the Linnik interferometer was designed, built, and tested. Two methods were used for interference pattern measurement: phase-shifting and polarized single-shot methods. The former uses a low coherence light emitting…
The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental…
Lithium niobate-on-insulator (LNOI) is an emerging photonic platform that exhibits favorable material properties (such as low optical loss, strong nonlinearities, and stability) and enables large-scale integration with stronger optical…
Nonlinear optics is of crucial importance in several fields of science and technology with applications in frequency conversion, entangled-photon generation, self-referencing of frequency combs, crystal characterization, sensing, and…
Nano-size objects like metal clusters present an ideal system for the study of quantum phenomena and for constructing practical quantum devices. Integrating these small objects in a macroscopic circuit is, however, a difficult task. So far…
The scientific community has witnessed tremendous expansion of research on layered (i.e. two-dimensional, 2D) materials, with increasing recent focus on applications to photonics. Layered materials are particularly exciting for manipulating…
The concept of high refractive index subwavelength dielectric nanoresonators, supporting electric and magnetic optical resonances, is a promising platform for waveguiding, sensing, and nonlinear nanophotonic devices. However, high…
Direct laser Interference Patterning (DLIP) with ultrashort laser pulses (ULP) represents a precise and fast technique to produce tailored periodic sub-micrometer structures on various materials. In this work, an experimental and…
We have investigated the nanostructure and microstructure resulting from ns laser irradiation simultaneous with deposition of Co films on Si(001) substrates. The spatial order and length scales of the resulting nanopatterns and their…
Multilayer metasurfaces (MLMs) represent a versatile type of three-dimensional optical metamaterials that could enable ultra-thin and multi-functional photonic components. Herein we demonstrate an approach to readily fabricate MLMs…
Focusing electromagnetic energy to sub-wavelength dimensions has become an increasingly active field of research for a variety of applications such as Heat Assisted Magnetic Recording (HAMR), nanolithography, and nanoscale optical…
In a hierarchical nanopatterning routine relying exclusively on self-assembly processes we combine crystal surface reconstruction, microphase separation of copolymers, and selective metal diffusion to produce monodisperse metal…
Controlling the transport, trapping, and filtering of nanoparticles is important for many applications. By virtue of their weak response to gravity and their thermal motion, various physical mechanisms can be exploited for such operations…
We develop a technique for realizing lithium niobate on insulator (LNOI) waveguides of a multi-centimeter-length with a propagation loss as low as 0.027 dB/cm. Our technique relies on patterning a chromium (Cr) thin film coated on the top…
The quest of a nonlinear optical material that can be easily nanostructured over a large surface area is still ongoing. Here, we demonstrate a nanoimprinted nonlinear barium titanate 2D nanohole array that shows optical properties of a 2D…
Oblique angle deposition (OAD) is a nanostructuration method widely used to tune the optical properties of thin films. The introduction of porosity controlled by the deposition angle is used to develop the architecture of each layer and…
Dewetting of thin metal films is one of the most widespread method for functional plasmonic nanostructures fabrication. However, simple thermal-induced dewetting does not allow to control degree of nanostructures order without additional…
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates the trade-offs between manufacturing process expense and…
Additive manufacturing at the micro- and nanoscale has seen a recent upsurge to suit the increasing demand for more elaborate structures. However, the integration and precise placement of multiple distinct materials at small scales remain a…
Achieving fast and continuous fabrication of large-scale complex 3D structures is key to unlocking industrial-scale adoption of two-photon lithography (TPL). Despite substantial improvement in peak optical patterning rates enabled by recent…