Related papers: Thin film deposition with time varying temperature
We study the time evolution of a thin liquid film coating the outer surface of a sphere in the presence of gravity, surface tension and thermal gradients. We derive the fourth-order nonlinear partial differential equation that models the…
The leading order "temperature" of a dense two dimensional granular material fluidised by external vibrations is determined. An asymptotic solution is obtained where the particles are considered to be elastic in the leading approximation.…
It is shown how the combination of atomic deposition and nonlinear diffusion may lead, below a critical temperature, to the growth of nonuniform layers on a substrate. The dynamics of such a system is of the Cahn-Hilliard type, supplemented…
We examine the structural relaxation of glassy materials at finite temperatures, considering the effect of activated rearrangements and long-range elastic interactions. Our three-dimensional mesoscopic relaxation model shows how the…
Physical vapor deposition (PVD) is widely used in manufacturing ultra-thin layers of amorphous organic solids. Here, we demonstrate that these films exhibit a sharp transition from glassy solid to liquid-like behavior with thickness below…
We study how the substrate temperature influences the structural properties of carbon films deposited by PVD (physical vapor deposition) techniques. We adapted a heating system inside the deposition chamber, with temperatures up to…
Further development of nuclear power plant technology relies heavily on materials durability under operating conditions. Estimating the materials performance in the operando tests is crucial. In this paper, the mechanical behavior of thin…
This Letter reports an anomaly of film porosity dependence on deposition rate during physical vapor deposition - the porosity increases as deposition rate decreases. Using glancing angle deposition of Cu on SiO2 substrate, the authors show…
The roughness of vapor-deposited thin films can display a nonmonotonic dependence on film thickness, if the smoothening of the small-scale features of the substrate dominates over growth-induced roughening in the early stage of evolution.…
I study numerically the problem of delamination of a thin film elastically attached to a rigid substrate. A nominally flat elastic thin film is modeled using a two-dimensional triangular mesh. Both compression and bending rigidities are…
We study a model for thin film electrodeposition in which instability development by preferential adsorption and reduction of cations at surface peaks competes with surface relaxation by diffusion of the adsorbates. The model considers…
The stability of interfaces and the mechanisms of thin film growth on semiconductors are issues of central importance in electronic devices. These issues can only be understood through detailed study of the relevant microscopic processes.…
In this Letter, we systematically investigate the Leidenfrost temperature for hot solid substrates with various thermal diffusivities and surface roughnesses. Based on the experimental results, we build a phenomenological model that…
The effect of finite temperature $T$ and finite strain rate $\dot\gamma$ on the statistical physics of plastic deformations in amorphous solids made of $N$ particles is investigated. We recognize three regimes of temperature where the…
During coating processes, dust deposition can lead to an uneven thickness in the resulting film, posing significant problems in industrial processes. Our study explores the effects of solid defects using a vertical cylindrical fiber…
The peculiarities of thermal expansion of $bcc$ and $fcc$ zirconium films with (100) and (110) crystallographic orientations are studied at a constant zero pressure by the molecular dynamics (MD) method with a many-body interatomic…
We present a model for thin film growth by particle deposition that takes into account the possible evaporation of the particles deposited on the surface. Our model focuses on the formation of two-dimensional structures. We find that the…
The random deposition model must be enriched to reflect the variety of surface roughness due to some material characteristics of the film growing by vacuum deposition or sputtering. The essence of the computer simulation in this case is to…
We study the short time properties of a two-dimensional film growth model in which incident particles execute advective-diffusive motion with a vertical step followed by $D$ horizontal steps. The model represents some features of the…
The structural aspects of polyacrylamide thin films annealed at degradation threshold temperature have been studied as a function of annealing time using in situ X-ray reflectivity technique in vacuum. We observe significant decrease of…