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Low-pressure multi-frequency capacitively coupled plasmas are used for numerous etch and deposition applications in the semiconductor industry. Pulsing of the radio-frequency (RF) sources enables control of neutral and charged species in…

Plasma Physics · Physics 2023-05-26 Abhishek Verma , Shahid Rauf , Kallol Bera , D. Sydorenko , A. Khrabrov , I. Kaganovich

Following requirements of the plasma processing industry for increasing throughput, capacitively coupled plasma reactors with large area electrodes driving by very high frequency sources have been proposed. However, such reactors with…

Plasma Physics · Physics 2015-10-13 D. Eremin

The physics of capacitively coupled plasma (CCP) discharges is investigated in a mildly magnetized regime, defined by $1 \le f_{ce}/f_{rf} < 2$, where $f_{ce}$ and $f_{rf}$ denote the electron cyclotron frequency and the applied…

Plasma Physics · Physics 2026-05-20 Deepak Gautam , Sarveshwar Sharma , Igor Kaganovich , Bhooshan Paradkar

We report the existence of an enhanced operating regime for a high-frequency, low-pressure capacitively coupled plasma (CCP) discharge in the presence of a weak magnetic field applied parallel to the electrodes. Our PIC-MCC simulations show…

Plasma Physics · Physics 2020-12-07 Sanket Patil , Sarveshwar Sharma , Sudip Sengupta , Abhijit Sen , Igor Kaganovich

The dynamical characteristics of a single frequency low pressure capacitively coupled plasma (CCP) device under varying applied RF voltages and driving frequencies are studied using particle-in-cell/Monte Carlo collision simulations. An…

Plasma Physics · Physics 2018-08-29 Sarveshwar Sharma , Abhijit Sen , N. Sirse , M. M. Turner , A. R. Ellingboe

An independent control of the flux and energy of ions impacting on an object immersed in a plasma is often desirable for many industrial processes such as microelectronics manufacturing. We demonstrate that a simultaneous control of these…

Plasma Physics · Physics 2018-08-29 Sarveshwar Sharma , Igor Kaganovich , Alexander Khrabrov , Predhiman Kaw , Abhijit Sen

Phenomena taking place in capacitively coupled plasmas with large electrodes and driven at very high frequencies are studied numerically utilizing a novel energy- and charge-conserving implicit fully electromagnetic particle-in-cell / Monte…

Plasma Physics · Physics 2023-05-17 D. Eremin , E. Kemaneci , M. Matsukuma , T. Mussenbrock , R. P. Brinkmann

In this work, we analyze the creation of the discharge asymmetry and the concomitant formation of the DC self-bias voltage in capacitively coupled radio frequency plasmas driven by multi-frequency waveforms, as a function of the electrode…

Plasma Physics · Physics 2024-06-19 R. U. Masheyeva , K. N. Dzhumagulova , M. Myrzaly , J. Schulze , Z. Donko

Particle-in-cell/Monte Carlo technique is used to simulate low pressure electro-negative and electro-positive plasmas at a frequency of 10 MHz. The potential, electric field, electron and ion density, and currents flowing across the plasma…

Plasma Physics · Physics 2007-05-23 M. Ardehali

The Floating Potential Fluctuations (FPF) observed in a dc glow discharge plasma powered with two sources is modeled using an anharmonic oscillator with two forcing terms. In the discharge system, one of the electrode is biased to a…

In this work, the one-dimensional implicit particle-in-cell/Monte-Carlo collision code (PIC/MCC) is used to study the discharge of a capacitively coupled plasma (CCP) under extremely low pressure driven by high-frequency rf power in pure…

Plasma Physics · Physics 2023-12-12 Hao Wu , Ran An , Dong Zhong , Wei Jiang , Ya Zhang

This work investigates the discharge properties of a cylindrical magnetized capacitive coupled plasma discharge produced between a pair of coaxial cylinders. For the purpose of diagnosing plasma properties and electron energy distribution…

The behavior of capacitive coupled plasma (CCP) discharges is investigated in a mildly magnetized regime, defined by the condition 1 $\leq$ $f_{ce}/f_{rf}$ $\lt$ 2, where $f_{ce}$ and $f_{rf}$ are the cyclotron and radio-frequencies (RF),…

Plasma Physics · Physics 2026-05-20 Deepak Gautam , Sarveshwar Sharma , Igor Kaganovich , Bhooshan Paradkar

With an implicit Particle-in-cell/Monte Carlo model, capacitively coupled plasmas are studied in two-dimensional and axisymmetric geometry. Self-bias dc voltage effects are self-consistently considered. Due to finite length effects, the…

Plasma Physics · Physics 2011-04-22 Wei Jiang , Hong-yu Wang , Zhen-hua Bi , You-nian Wang

The influence of charge trap states in the dielectric boundary material on capacitively coupled radio frequency plasma discharge is investigated with theory and Particle in cell/Monte Carlo Collision simulation. It is found that the trap…

Plasma Physics · Physics 2022-04-18 Shu Zhang , Guang-Yu Sun , Volčokas Arnas , Guan-Jun Zhang , An-Bang Sun

A new method for generating entangled photons with controllable frequency correlation via spontaneous parametric down-conversion (SPDC) is presented. The method entails initiating counter-propagating SPDC in a single-mode nonlinear…

While the coherent potential approximation (CPA) is the prevalent method for the study of disordered electronic systems, it fails to capture non-local correlations and Anderson localization. To incorporate such effects, we extend the dual…

Strongly Correlated Electrons · Physics 2013-05-08 H. Terletska , S. -X. Yang , Z. Y. Meng , J. Moreno , M. Jarrell

Current-free double layers of the type reported in plasmas in the presence of an expanding magnetic field [C. Charles and R. W. Boswell, Appl. Phys. Lett. 82, 1356 (2003)] are modeled theoretically and with particle-in-cell/Monte Carlo…

Plasma Physics · Physics 2015-06-12 S. D. Baalrud , T. Lafleur , R. W. Boswell , C. Charles

Using a model methane-like chiral system, we theoretically demonstrate a possibility to access photoelectron circular dichroism (PECD) by a single experiment with two overlapping laser pulses of carrier frequencies $\omega$ and $2\omega$,…

Atomic and Molecular Clusters · Physics 2018-12-20 Philipp V. Demekhin , Anton N. Artemyev , Alexander Kastner , Thomas Baumert

Capacitively coupled plasmas (CCP) comprise one of the main tool in active use in the plasma processing industry. However, increasing the driving frequency and electrode size is limited by the emergence of plasma radial nonuniformity…

Plasma Physics · Physics 2023-03-03 D. Eremin , E. Kemaneci , M. Matsukuma , I. Kaganovich , T. Mussenbrock , R. P. Brinkmann
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