Related papers: Nano Imprint Lithography on Silica Sol-gels: a sim…
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
Surface-relief gratings fabricated through nanoimprint lithography (NIL) are prone to topographic distortion induced by resist shrinkage. Characterizing the impact of this effect on blazed diffraction efficiency is particularly important…
Nanoimprint lithography (NIL) is an attractive nonconventional lithographic technique in the fabrication of superconducting nanowires for superconducting nanowire single-photon detectors (SNSPDs) with large effective detection areas or…
Optical metasurfaces, consisting of subwavelength-scale meta-atom arrays, hold great promise to overcome fundamental limitations of conventional optics. Scalable nanomanufacturing of metasurfaces with high uniformity and reproducibility is…
Laser Interference Lithography (LIL) is a versatile fabrication method for patterning sub-micron structures in arrays covering large areas. It is a facile and fast mask-less lithography process to produce large area periodic patterns. The…
Nanoimprint lithography (NIL) is a widely used high-throughput fabrication technique for photonic devices, yet its reliability is often compromised by the inevitable imperfections that arise during the demolding process. Topological…
Methods to fabricate and characterize monodisperse magnetic nanoplatelets for fluid/bio-based applications based on spintronic thin-film principles are a challenge. This is due to the required top-down approach where the transfer of…
The selective area growth of Ga-assisted GaAs nanowires (NWs) with a high vertical yield on Si(111) substrates is still challenging. Here, we explore different surface preparations and their impact on NW growth by molecular beam epitaxy. We…
This paper presents a novel method to parallel fabricate large area (wafer scale) metallic nano-split-ring arrays with nanoimprint lithography (NIL). To our knowledge it is the first method that can pattern large area and high dense…
Patterning of diamond-like carbon (DLC) and DLC:metal nanocomposites is of interest for an increasing number of applications. We demonstrate a nanoimprint lithography process based on silicon containing thermoplastic resist combined with…
Colloidal lithography [1] is how patterns are reproduced in a variety of natural systems and is used more and more as an efficient fabrication tool in bio-, opto-, and nano-technology. Nanoparticles in the colloid are made to form a mask on…
Colloidal lithography has emerged as a promising alternative to conventional nanofabrication techniques, offering the ability to create nanoscale patterns in a cost-effective and scalable manner. However, it has been so far limited by…
The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…
Exploiting elastic instability in thin films has proven a robust method for creating complex patterns and structures across a wide range of lengthscales. Even the simplest of systems, an elastic membrane with a lattice of pores, under…
An integrated interference and colloid sphere lithography (IICL) is presented to produce complex plasmonic structures consisting of wavelength-scaled periodic arrays of nano-objects with arbitrary array symmetry and controllable nano-scaled…
Magneto-plasmonic nanostructures have emerged as promising candidates for advanced sensing applications. However, conventional fabrication methods, such as lithography and sputtering, often involve high costs and complex processes. This…
Various nanostructured thin solid films on silicate based glass plates commonly used as substrates in contemporary vacuum technologies are studied. Evolution of mesostructured spiral and spiral crack patterns as a result of shrinkage or…
Direct nanoimprinting provides a simple and high-throughput route for producing uniform nanopatterns at great precision and at low costs. However, applying this technique to crystalline metals has been considered as impossible due to…
The most direct definition of a patterning process' resolution is the smallest half-pitch feature it is capable of transferring onto the substrate. Here we demonstrate that thermal Scanning Probe Lithography (t-SPL) is capable of…
Surface-patterned ZnO thin films were fabricated by direct imprinting on ZnO sol and subsequent annealing process. The polymer-based ZnO sols were deposited on various substrates for the nanoimprint lithography and converted to…