English

Yield and performance validation of the Monolithic Stitched Sensor (MOSS), the first wafer-scale prototype for the ALICE ITS3 upgrade

Instrumentation and Detectors 2025-11-05 v1

Abstract

The ALICE Inner Tracking System upgrade (ITS3) will employ stitched, wafer-scale Monolithic Active Pixel Sensors (MAPS) for the first time in high-energy physics, achieving a material budget of only 0.09\,%\,X0\mathrm{_{0}} per layer. Its first stitched prototype, the Monolithic Stitched Sensor (MOSS), underwent serial testing confirming sensor yield compliance with ITS3 requirements. In-beam tests show the device meets the ITS3 efficiency requirement of >\,99\,% while maintaining a fake-hit rate below 0.1\,hits/pixel/s, with performance sustained up to irradiation levels of 4\,kGy and 4×10124\times10^{12}1MeV\,neq\mathrm{_{eq}}\,cm2\mathrm{^{-2}}. The sensor demonstrates excellent charge-collection properties and linearity between time-over-threshold and deposited energy in the 1.8 - 6.5\,keV range in response to soft X-ray emissions. This article provides an overview of the validation steps and characterisation results.

Keywords

Cite

@article{arxiv.2511.02403,
  title  = {Yield and performance validation of the Monolithic Stitched Sensor (MOSS), the first wafer-scale prototype for the ALICE ITS3 upgrade},
  author = {Marius Wilm Menzel},
  journal= {arXiv preprint arXiv:2511.02403},
  year   = {2025}
}