When Could Abelian Fractional Topological Insulators Exist in Twisted MoTe$_2$ (and Other Systems)
Abstract
Using comprehensive exact diagonalization calculations on twisted bilayer MoTe (MoTe), as well as idealized Landau level models also relevant for lower , we extract general principles for engineering fractional topological insulators (FTIs) in realistic situations. First, in a Landau level setup at , we investigate what features of the interaction destroy an FTI. For both pseudopotential interactions and realistic screened Coulomb interactions, we find that sufficient suppression of the short-range repulsion is needed for stabilizing an FTI. We then study MoTe with realistic band-mixing and anisotropic non-local dielectric screening. Our finite-size calculations only find an FTI phase at in the presence of a significant additional short-range attraction that acts to counter the Coulomb repulsion at short distances. We discuss how further finite-size drifts, dielectric engineering, Landau level character, and band-mixing effects may reduce the required value of closer towards the experimentally relevant conditions of MoTe. Projective calculations into the Landau level, which resembles the second valence band of MoTe, do not yield FTIs for any , suggesting that FTIs at low-angle MoTe for and may be unlikely. While our study highlights the challenges, at least for the fillings considered, to obtaining an FTI with transport plateaus, even in large-angle MoTe where fractional Chern insulators are experimentally established, we also provide potential sample-engineering routes to improve the stability of FTI phases.
Keywords
Cite
@article{arxiv.2407.02560,
title = {When Could Abelian Fractional Topological Insulators Exist in Twisted MoTe$_2$ (and Other Systems)},
author = {Yves H. Kwan and Glenn Wagner and Jiabin Yu and Andrea Kouta Dagnino and Yi Jiang and Xiaodong Xu and B. Andrei Bernevig and Titus Neupert and Nicolas Regnault},
journal= {arXiv preprint arXiv:2407.02560},
year = {2024}
}
Comments
6+36 pages