Volume Fabrication of Quantum Cascade Lasers on 200 mm-CMOS pilot line
Abstract
The manufacturing cost of quantum cascade lasers is still a major bottleneck for the adoption of this technology for chemical sensing. The integration of Mid-Infrared sources on Si substrate based on CMOS technology paves the way for high-volume low-cost fabrication. Furthermore, the use of Si-based fabrication platform opens the way to the co-integration of QCL Mid-InfraRed sources with SiGe-based waveguides, allowing realization of optical sensors fully integrated on planar substrate. We report here the fabrication and the characterization of DFB-QCL sources using top metal grating approach working at 7.4 microns fully implemented on our 200 mm CMOS pilot line. These QCL featured threshold current density of 2.5 kA/cm2 and a linewidth of 0.16 cm-1 with a high fabrication yield. This approach paves the way toward a Mid-IR spectrometer at the silicon chip level.
Keywords
Cite
@article{arxiv.1910.07821,
title = {Volume Fabrication of Quantum Cascade Lasers on 200 mm-CMOS pilot line},
author = {JG Coutard and M Brun and M Fournier and O Lartigue and F Fedeli and G Maisons and JM Fedeli and S Nicoletti and M Carras and L Duraffourg},
journal= {arXiv preprint arXiv:1910.07821},
year = {2019}
}
Comments
12 pages, 4 figures