Universal wavenumber selection laws in apical growth
Pattern Formation and Solitons
2016-09-07 v1
Abstract
We study pattern-forming dissipative systems in growing domains. We characterize classes of boundary conditions that allow for defect-free growth and derive universal scaling laws for the wavenumber in the bulk of the domain. Scalings are based on a description of striped patterns in semi-bounded domains via strain-displacement relations. We compare predictions with direct simulations in the Swift-Hohenberg, the Complex Ginzburg-Landau, the Cahn-Hilliard, and reaction-diffusion equations.
Keywords
Cite
@article{arxiv.1602.02281,
title = {Universal wavenumber selection laws in apical growth},
author = {Ryan Goh and Rajendra Beekie and Daniel Matthias and Joshua Nunley and Arnd Scheel},
journal= {arXiv preprint arXiv:1602.02281},
year = {2016}
}