Two-dimensional extreme skin depth engineering for CMOS photonics
Optics
2021-04-07 v2
Abstract
Extreme skin depth engineering (e-skid) can be applied to integrated photonics to manipulate the evanescent field of a waveguide. Here we demonstrate that e-skid can be implemented in two directions in order to deterministically engineer the evanescent wave allowing for dense integration with enhanced functionalities. In particular, by increasing the skin depth, we enable the creation of large gap, bendless directional couplers with large operational bandwidth. Here we experimentally validate two-dimensional e-skid for integrated photonics in a CMOS photonics foundry and demonstrate strong coupling with a gap of 1.44 {\mu}m.
Keywords
Cite
@article{arxiv.2005.14265,
title = {Two-dimensional extreme skin depth engineering for CMOS photonics},
author = {Matthew van Niekerk and Saman Jahani and Justin Bickford and Pak Cho and Stephen Anderson and Gerald Leake and Daniel Coleman and Michael L. Fanto and Christopher C. Tison and Gregory A. Howland and Zubin Jacob and Stefan F. Preble},
journal= {arXiv preprint arXiv:2005.14265},
year = {2021}
}
Comments
13 pages, 9 figures