Topological Dislocation Response in Elementary Semiconductors
Abstract
We study elementary semiconductors and insulators that are symmetric under spatial inversion: silicon, diamond, germanium, and black phosphorene. These materials are ideal candidates for realizing obstructed atomic insulators, which differ from trivial atomic insulators by a quantized spatial shift of their electronic Wannier centers with respect to the atomic lattice. We use symmetry indicator invariants that allow the prediction of non-trivial responses to crystal dislocations in these materials. We find that edge dislocations generically exhibit a non-trivial response, while screw dislocations always display a trivial response. With the aid of numerical simulations of realistic tight-binding models, we confirm the presence of mid-gap polarization bands localized along dislocations in silicon, diamond, and germanium.
Cite
@article{arxiv.2602.20754,
title = {Topological Dislocation Response in Elementary Semiconductors},
author = {Yuteng Zhou and Alexandre Chaduteau and Frank Schindler},
journal= {arXiv preprint arXiv:2602.20754},
year = {2026}
}