English

Thermal stability for domain wall mediated magnetization reversal in perpendicular STT MRAM cells with W insertion layers

Mesoscale and Nanoscale Physics 2021-02-03 v2 Materials Science

Abstract

We present an analytical model for calculating energy barrier for the magnetic field-driven domain wall-mediated magnetization reversal of a magneto-resistive random access memory (MRAM) cell and apply it to study thermal stability factor Δ\Delta for various thicknesses of W layers inserted into the free layer (FL) as a function of the cell size and temperature. We find that, by increasing W thickness, the effective perpendicular magnetic anisotropy (PMA) energy density of the FL film monotonically increases, but at the same time, Δ\Delta of the cell mainly decreases. Our analysis shows that, in addition to saturation magnetization MsM_s and exchange stiffness constant AexA_\mathrm{ex} of the FL film, the parameter that quantifies the Δ\Delta of the cell is its coercive field HcH_c, rather than the net PMA field HkH_k of the FL film comprising the cell.

Keywords

Cite

@article{arxiv.2008.00412,
  title  = {Thermal stability for domain wall mediated magnetization reversal in perpendicular STT MRAM cells with W insertion layers},
  author = {G. Mihajlovic and N. Smith and T. Santos and J. Li and B. D. Terris and J. A. Katine},
  journal= {arXiv preprint arXiv:2008.00412},
  year   = {2021}
}

Comments

8 pages, supplementary material included